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Nanoindentation and nanoscratching studies of amorphous carbon films

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dc.contributor.author Charitidis, C en
dc.contributor.author Logothetidis, S en
dc.contributor.author Douka, P en
dc.date.accessioned 2014-03-01T01:48:11Z
dc.date.available 2014-03-01T01:48:11Z
dc.date.issued 1999 en
dc.identifier.uri http://hdl.handle.net/123456789/25417
dc.subject Amorphous Carbon en
dc.subject Elastic Modulus en
dc.subject Elastic Properties en
dc.subject Ion Bombardment en
dc.subject Layered Structure en
dc.subject Mechanical Property en
dc.subject Plastic Deformation en
dc.subject Rf Magnetron Sputtering en
dc.subject Thin Film en
dc.title Nanoindentation and nanoscratching studies of amorphous carbon films en
heal.type journalArticle en
heal.identifier.primary 10.1016/S0925-9635(98)00285-4 en
heal.identifier.secondary http://dx.doi.org/10.1016/S0925-9635(98)00285-4 en
heal.publicationDate 1999 en
heal.abstract Hydrogen-free amorphous carbon (a-C) films prepared by RF magnetron sputtering were deposited on Si substrates in thin films, at various negative bias voltages Vb (i.e. Ar-ion energies), and in thick layered-structure films with alternative values of Vb. The main purposes of this work are to present preliminary results concerning the effect of Ar-ion bombardment during deposition on the elastic properties en
heal.journalName Diamond and Related Materials en
dc.identifier.doi 10.1016/S0925-9635(98)00285-4 en


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