Internal stress in growing ZrO2 films

Panagopoulos, ChrN

dc.contributor.author	Panagopoulos, ChrN	en
dc.date.accessioned	2014-03-01T01:08:24Z
dc.date.available	2014-03-01T01:08:24Z
dc.date.issued	1991	en
dc.identifier.issn	0022-5088	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/10466
dc.subject	Internal Stress	en
dc.subject.classification	Chemistry, Physical	en
dc.subject.classification	Metallurgy & Metallurgical Engineering	en
dc.subject.other	Stresses	en
dc.subject.other	Anodic Stress	en
dc.subject.other	Internal Stress	en
dc.subject.other	Valve Metals	en
dc.subject.other	Zirconium and Alloys	en
dc.title	Internal stress in growing ZrO2 films	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/0022-5088(91)90299-J	en
heal.identifier.secondary	http://dx.doi.org/10.1016/0022-5088(91)90299-J	en
heal.language	English	en
heal.publicationDate	1991	en
heal.abstract	The anodic and open-circuit stresses were studied during the potentiostatic anodic oxidation of zirconium. The anodic stress, i.e. the superposition of growth and electrostrictive stresses, was found to be compressive whereas the open-circuit stress was found to be tensile in the growing zirconium oxide. For a constant value of anodization time, the anodic stress was observed to decrease and the opencircuit stress to increase with increasing thickness of the growing zirconium oxide. © 1991.	en
heal.publisher	ELSEVIER SCIENCE SA LAUSANNE	en
heal.journalName	Journal of The Less-Common Metals	en
dc.identifier.doi	10.1016/0022-5088(91)90299-J	en
dc.identifier.isi	ISI:A1991FF60900004	en
dc.identifier.volume	168	en
dc.identifier.issue	2	en
dc.identifier.spage	175	en
dc.identifier.epage	182	en