A model for reactive magnetron sputtering

Tsiogas, CD; Avaritsiotis, JN

dc.contributor.author	Tsiogas, CD	en
dc.contributor.author	Avaritsiotis, JN	en
dc.date.accessioned	2014-03-01T01:08:37Z
dc.date.available	2014-03-01T01:08:37Z
dc.date.issued	1992	en
dc.identifier.issn	0042-207X	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/10611
dc.subject	Magnetron Sputtering	en
dc.subject.classification	Materials Science, Multidisciplinary	en
dc.subject.classification	Physics, Applied	en
dc.subject.other	Chemical Reactions - Reaction Kinetics	en
dc.subject.other	Sputtering - Chemical Reactions	en
dc.subject.other	Magnetron Sputtering	en
dc.subject.other	Reactive Sputtering	en
dc.subject.other	Sputtering	en
dc.title	A model for reactive magnetron sputtering	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/0042-207X(92)90262-U	en
heal.identifier.secondary	http://dx.doi.org/10.1016/0042-207X(92)90262-U	en
heal.language	English	en
heal.publicationDate	1992	en
heal.abstract	A steady-state model for the reactive sputtering process in a symmetrical planar magnetron configuration is presented which takes the specific system geometry into consideration. Further to the simulation of the well-known hysteresis effect and its consequences in the composition of the composition of the deposited film, the model allows for the calculation of the radial compositional distribution of the growing film as a function of the distance between the target and the condensation surface. The proposed model introduces a reactive gas profile across the reaction zone (instead of considering it to be constant), to account for the gettering action of both the magnetron target and condensation surface at relatively high sputtering rates and short target-to-substrate separations. The possibility of introducing reactive gas through the centre of the magnetron surface is also examined and the effects on the stoichiometry of the film as well as on the stability of the system are presented.	en
heal.publisher	PERGAMON-ELSEVIER SCIENCE LTD	en
heal.journalName	Vacuum	en
dc.identifier.doi	10.1016/0042-207X(92)90262-U	en
dc.identifier.isi	ISI:A1992HJ93000006	en
dc.identifier.volume	43	en
dc.identifier.issue	3	en
dc.identifier.spage	203	en
dc.identifier.epage	211	en