Practical aspects for the use of plasma emission monitoring in reactive magnetron sputtering processes

Tsiogas, C; Avaritsiotis, J; Kagarakis, C

dc.contributor.author	Tsiogas, C	en
dc.contributor.author	Avaritsiotis, J	en
dc.contributor.author	Kagarakis, C	en
dc.date.accessioned	2014-03-01T01:10:07Z
dc.date.available	2014-03-01T01:10:07Z
dc.date.issued	1994	en
dc.identifier.issn	0042-207X	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/11319
dc.subject	Magnetron Sputtering	en
dc.subject.classification	Materials Science, Multidisciplinary	en
dc.subject.classification	Physics, Applied	en
dc.subject.other	Control systems	en
dc.subject.other	Light emission	en
dc.subject.other	Monitoring	en
dc.subject.other	Oxygen	en
dc.subject.other	Plasma diagnostics	en
dc.subject.other	Thin films	en
dc.subject.other	Cathode voltage	en
dc.subject.other	Indium oxide thin films	en
dc.subject.other	Oxygen flows	en
dc.subject.other	Plasma emission monitoring (PEM)	en
dc.subject.other	Reactive magnetron sputtering	en
dc.subject.other	Target oxidation	en
dc.subject.other	Tin oxide thin films	en
dc.subject.other	Magnetron sputtering	en
dc.title	Practical aspects for the use of plasma emission monitoring in reactive magnetron sputtering processes	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/0042-207X(94)90078-7	en
heal.identifier.secondary	http://dx.doi.org/10.1016/0042-207X(94)90078-7	en
heal.language	English	en
heal.publicationDate	1994	en
heal.abstract	The sensitivity of Plasma Emission Monitoring (PEM) depends on both target material and oxygen mass flow at least for indium and tin target. Optical emission intensity and cathode voltage were recorded for several argon and oxygen flows in various tin and indium oxide thin film fabrication experiments, with the magnetron working in constant current mode. The results obtained indicate marked differences between indium and tin targets, as far as their reactive sputtering behaviour is concerned. A theoretical explanation is proposed for the observed target voltage variations with increasing oxygen mass flow in relation to the corresponding optical emission intensities. © 1994.	en
heal.publisher	PERGAMON-ELSEVIER SCIENCE LTD	en
heal.journalName	Vacuum	en
dc.identifier.doi	10.1016/0042-207X(94)90078-7	en
dc.identifier.isi	ISI:A1994PU78200004	en
dc.identifier.volume	45	en
dc.identifier.issue	12	en
dc.identifier.spage	1181	en
dc.identifier.epage	1186	en