A comparative study of CH4 and CF4 rf discharges using a consistent plasma physics and chemistry simulator

Mantzaris, NV; Gogolides, E; Boudouvis, AG

dc.contributor.author	Mantzaris, NV	en
dc.contributor.author	Gogolides, E	en
dc.contributor.author	Boudouvis, AG	en
dc.date.accessioned	2014-03-01T01:11:35Z
dc.date.available	2014-03-01T01:11:35Z
dc.date.issued	1996	en
dc.identifier.issn	0272-4324	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/11720
dc.subject	CH4, CH3, CH2, H, CF4, CF3, CF2, CF, F	en
dc.subject	Electron energy distribution function	en
dc.subject	Plasma chemistry	en
dc.subject	Rf plasma modeling	en
dc.subject.classification	Engineering, Chemical	en
dc.subject.classification	Physics, Applied	en
dc.subject.classification	Physics, Fluids & Plasmas	en
dc.subject.other	RADIOFREQUENCY GLOW-DISCHARGES	en
dc.subject.other	RADIO-FREQUENCY PLASMAS	en
dc.subject.other	ELECTRON-IMPACT IONIZATION	en
dc.subject.other	LASER-INDUCED FLUORESCENCE	en
dc.subject.other	GAS-PHASE PHYSICS	en
dc.subject.other	CROSS-SECTIONS	en
dc.subject.other	NEUTRAL RADICALS	en
dc.subject.other	METHANE	en
dc.subject.other	ATTACHMENT	en
dc.subject.other	DISSOCIATION	en
dc.title	A comparative study of CH4 and CF4 rf discharges using a consistent plasma physics and chemistry simulator	en
heal.type	journalArticle	en
heal.identifier.primary	10.1007/BF01447148	en
heal.identifier.secondary	http://dx.doi.org/10.1007/BF01447148	en
heal.language	English	en
heal.publicationDate	1996	en
heal.abstract	A self-consistent, one-dimensional simulator for the physics and chemistry of radio frequency (rf) plasmas was developed and applied for CH4 and CF4. The simulator consists of a fluid model for the discharge physics, a commercial Boltzmann equation solver for calculations of electron energy distribution function (EEDF), a generalized plasma chemistry code, and an interface module among the three models. The CH4 and CF4 discharges are compared and contrasted: CH4 plasmas are electropositive, with negative ion densities one order of magnitude less than those of electrons, whereas CF4 plasmas are electronegative, with ten times more negative ions than electrons. The high-energy tail of the EEDF in CH4 lies below both the Druyvensteyn and Maxwell distributions, whereas the EEDF high-energy tail in CF4 lies between the two. For CH4, the chemistry model was applied for four species, namely, CH4, CH3, CH2, and H, whereas for CF4, five species were examined, namely CF4, CF3, CF2, CF, and F. The predicted densities and profiles compare favorably with experimental data. Finally, the chemistry results were fed back into the physics model until convergence was obtained.	en
heal.publisher	PLENUM PUBL CORP	en
heal.journalName	Plasma Chemistry and Plasma Processing	en
dc.identifier.doi	10.1007/BF01447148	en
dc.identifier.isi	ISI:A1996VK36400002	en
dc.identifier.volume	16	en
dc.identifier.issue	3	en
dc.identifier.spage	301	en
dc.identifier.epage	327	en