Discharge and circuit simulation of a plasma cathode TEA HF laser operating with a He/SF6/C3H8 gas mixture

Tsikrikas, GN; Serafetinides, AA

dc.contributor.author	Tsikrikas, GN	en
dc.contributor.author	Serafetinides, AA	en
dc.date.accessioned	2014-03-01T01:12:46Z
dc.date.available	2014-03-01T01:12:46Z
dc.date.issued	1997	en
dc.identifier.issn	0030-4018	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/12239
dc.subject	Circuit Simulation	en
dc.subject.classification	Optics	en
dc.subject.other	Current voltage characteristics	en
dc.subject.other	Electric resistance measurement	en
dc.subject.other	Laser produced plasmas	en
dc.subject.other	Mathematical models	en
dc.subject.other	Photocathodes	en
dc.subject.other	Plasma simulation	en
dc.subject.other	Laser discharge simulation	en
dc.subject.other	Gas lasers	en
dc.title	Discharge and circuit simulation of a plasma cathode TEA HF laser operating with a He/SF6/C3H8 gas mixture	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0030-4018(96)00560-3	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0030-4018(96)00560-3	en
heal.language	English	en
heal.publicationDate	1997	en
heal.abstract	A circuit and discharge simulation is presented for a TEA HF laser operating with a He/SF6/C3H8 gas mixture. A comparison of the simulated discharge voltage, current, resistance and input power with the corresponding experimental results is presented together with a discussion on the factors affecting the simulation accuracy.	en
heal.publisher	ELSEVIER SCIENCE BV	en
heal.journalName	Optics Communications	en
dc.identifier.doi	10.1016/S0030-4018(96)00560-3	en
dc.identifier.isi	ISI:A1997WB60100028	en
dc.identifier.volume	134	en
dc.identifier.issue	1-6	en
dc.identifier.spage	145	en
dc.identifier.epage	148	en