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Simultaneous emission of the HF and N2 lines from a plasma cathode tea laser

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dc.contributor.author Serafetinides, AA en
dc.contributor.author Tsikrikas, GN en
dc.contributor.author Papayannis, AD en
dc.contributor.author Atanasov, PA en
dc.date.accessioned 2014-03-01T01:13:24Z
dc.date.available 2014-03-01T01:13:24Z
dc.date.issued 1997 en
dc.identifier.issn 0018-9197 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/12445
dc.subject Gas lasers en
dc.subject HF laser en
dc.subject N2 laser en
dc.subject Pulsed lasers en
dc.subject Ultraviolet generation en
dc.subject.classification Engineering, Electrical & Electronic en
dc.subject.classification Physics, Applied en
dc.subject.other SLIDING-DISCHARGE en
dc.subject.other NITROGEN LASER en
dc.subject.other PERFORMANCE en
dc.subject.other CIRCUITS en
dc.subject.other EXCITATION en
dc.subject.other ABLATION en
dc.title Simultaneous emission of the HF and N2 lines from a plasma cathode tea laser en
heal.type journalArticle en
heal.identifier.primary 10.1109/3.644097 en
heal.identifier.secondary http://dx.doi.org/10.1109/3.644097 en
heal.language English en
heal.publicationDate 1997 en
heal.abstract Simultaneous laser action from HF and N2 is obtained, from a plasma cathode TEA laser, for the first time. The sliding discharge along the surface of a dielectric is used as a plasma cathode, for the main volumetric discharge. The laser operates at atmospheric pressure, with a gas mixture of SF6:C3H8:N2He. For a typical flow rate ratio of 0.27:0.024:0.2:19.8 lmin-1, it produces simultaneously 160 mJ HF and 0.6 mJ N2 laser outputs at 0.43% and 1.4×10-3% efficiencies respectively, at the moderate charging voltage of 28.5 kV. These output characteristics are obtained from a small active discharge volume and length of 106 cm3 and 38 cm respectively. These values extend the performance, recently reported in the literature, of a sliding discharge HF/N2laser with corresponding simultaneous energy outputs of 12 mJ HF and 1.1 mJ N2 , to a higher energy output level, thus making the device suitable for a broader range of applications. This novel dual wavelength HF/N2 laser system presented, can be particularly convenient for medical experiments, where the IR beam can be used for tissue ablation, while the UV beam can be used as the excitation source for fluorescence spectroscopic measurements, for the evaluation of the ablation process. Details are presented on the dependence of the laser performance parameters, such as output energy, discharge voltage and current and structure of the laser output pulses on the mixture composition and the circuit parameters. © 1997 IEEE. en
heal.publisher IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC en
heal.journalName IEEE Journal of Quantum Electronics en
dc.identifier.doi 10.1109/3.644097 en
dc.identifier.isi ISI:A1997YG98900005 en
dc.identifier.volume 33 en
dc.identifier.issue 12 en
dc.identifier.spage 2167 en
dc.identifier.epage 2172 en


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