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Raman linewidths of phonons in Si, Ge, and SiC under pressure

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dc.contributor.author Ulrich, C en
dc.contributor.author Debernardi, A en
dc.contributor.author Anastassakis, E en
dc.contributor.author Syassen, K en
dc.contributor.author Cardona, M en
dc.date.accessioned 2014-03-01T01:15:06Z
dc.date.available 2014-03-01T01:15:06Z
dc.date.issued 1999 en
dc.identifier.issn 0370-1972 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/13345
dc.subject.classification Physics, Condensed Matter en
dc.subject.other FUNCTIONAL PERTURBATION-THEORY en
dc.subject.other DIELECTRIC-PROPERTIES en
dc.subject.other SILICON-CARBIDE en
dc.subject.other DEPENDENCE en
dc.subject.other SCATTERING en
dc.subject.other SEMICONDUCTORS en
dc.subject.other CALIBRATION en
dc.title Raman linewidths of phonons in Si, Ge, and SiC under pressure en
heal.type journalArticle en
heal.identifier.primary 10.1002/(SICI)1521-3951(199901)211:1<293::AID-PSSB293>3.0.CO;2-O en
heal.identifier.secondary http://dx.doi.org/10.1002/(SICI)1521-3951(199901)211:1<293::AID-PSSB293>3.0.CO;2-O en
heal.language English en
heal.publicationDate 1999 en
heal.abstract We have investigated the pressure dependence of the lifetimes of zone-center optical phonons in Si, Ge, and 3C-SiC. The mechanism leading to a finite lifetime is the anharmonic decay into phonons of lower energy. Experimentally, the lifetime is determined from the full width at half maximum of Raman lines measured at low temperature. The experimental results for the linewidths as well as phonon frequencies are compared to results of ab-initio calculations which are based. on third-order density functional perturbation theory. en
heal.publisher WILEY-V C H VERLAG GMBH en
heal.journalName Physica Status Solidi (B) Basic Research en
dc.identifier.doi 10.1002/(SICI)1521-3951(199901)211:1<293::AID-PSSB293>3.0.CO;2-O en
dc.identifier.isi ISI:000078185000046 en
dc.identifier.volume 211 en
dc.identifier.issue 1 en
dc.identifier.spage 293 en
dc.identifier.epage 300 en


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