Photolithographic patterning of proteins with photoresists processable under biocompatible conditions

Douvas, A; Argitis, P; Diakoumakos, CD; Misiakos, K; Dimotikali, D; Kakabakos, SE

dc.contributor.author	Douvas, A	en
dc.contributor.author	Argitis, P	en
dc.contributor.author	Diakoumakos, CD	en
dc.contributor.author	Misiakos, K	en
dc.contributor.author	Dimotikali, D	en
dc.contributor.author	Kakabakos, SE	en
dc.date.accessioned	2014-03-01T01:16:56Z
dc.date.available	2014-03-01T01:16:56Z
dc.date.issued	2001	en
dc.identifier.issn	1071-1023	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/14283
dc.subject.classification	Engineering, Electrical & Electronic	en
dc.subject.classification	Nanoscience & Nanotechnology	en
dc.subject.classification	Physics, Applied	en
dc.subject.other	Acrylics	en
dc.subject.other	Biocompatibility	en
dc.subject.other	Copolymers	en
dc.subject.other	Photoresists	en
dc.subject.other	Polyacrylates	en
dc.subject.other	Proteins	en
dc.subject.other	Semiconducting silicon	en
dc.subject.other	Surface treatment	en
dc.subject.other	Biomolecules	en
dc.subject.other	Hydroxyethyl methacrylate	en
dc.subject.other	Isobornyl methacrylate	en
dc.subject.other	Polybutyl acrylate	en
dc.subject.other	Photolithography	en
dc.title	Photolithographic patterning of proteins with photoresists processable under biocompatible conditions	en
heal.type	journalArticle	en
heal.identifier.primary	10.1116/1.1408954	en
heal.identifier.secondary	http://dx.doi.org/10.1116/1.1408954	en
heal.language	English	en
heal.publicationDate	2001	en
heal.abstract	The microlithographic patterning of proteins on solid substrates using photoresists, which can be processed in the presence of biomolecules without affecting their bioactivity, is reported. Chemically amplified resist materials based on poly(t-butyl acrylate) and a newly synthesized copolymer of t-butyl methacrylate, 2-hydroxyethyl methacrylate, isobornyl methacrylate, and acrylic acid designed for this application, are evaluated regarding capabilities for processing under biocompatible conditions (processing temperatures at about 50 degreesC or lower and development with dilute aqueous base developers). The photoresist formulations based on the newly synthesized (meth)acrylate copolymer had higher sensitivity and contrast allowing lithographic processing even without postexposure bake. Patterns down to 3.75 mum lines/spaces of two different protein molecules, rabbit Immunoglobulin G and bovine serum albumin, on aminosilane-treated silicon surfaces, were obtained with a photoresist formulation based on the new copolymer and an onium salt photoacid generator under biocompatible processing conditions. (C) 2001 American Vacuum Society.	en
heal.publisher	A V S AMER INST PHYSICS	en
heal.journalName	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures	en
dc.identifier.doi	10.1116/1.1408954	en
dc.identifier.isi	ISI:000173159900150	en
dc.identifier.volume	19	en
dc.identifier.issue	6	en
dc.identifier.spage	2820	en
dc.identifier.epage	2824	en