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Strain-induced MI transition in n-Si and n-Ge: Physical mechanisms and transport phenomena

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dc.contributor.author Budzulyak, SI en
dc.contributor.author Gorin, AE en
dc.contributor.author Ermakov, VM en
dc.contributor.author Kolomoets, VV en
dc.contributor.author Venger, EF en
dc.contributor.author Verma, P en
dc.contributor.author Yamada, M en
dc.contributor.author Liarokapis, E en
dc.contributor.author Tunstall, DP en
dc.date.accessioned 2014-03-01T01:17:08Z
dc.date.available 2014-03-01T01:17:08Z
dc.date.issued 2001 en
dc.identifier.issn 0370-1972 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/14372
dc.subject Transport Phenomena en
dc.subject.classification Physics, Condensed Matter en
dc.subject.other METAL-INSULATOR-TRANSITION en
dc.title Strain-induced MI transition in n-Si and n-Ge: Physical mechanisms and transport phenomena en
heal.type journalArticle en
heal.identifier.primary 10.1002/1521-3951(200101)223:2<519::AID-PSSB519>3.0.CO;2-I en
heal.identifier.secondary http://dx.doi.org/10.1002/1521-3951(200101)223:2<519::AID-PSSB519>3.0.CO;2-I en
heal.language English en
heal.publicationDate 2001 en
heal.abstract The analysis of experimental data on the pressure and temperature dependences of conductivity, the current-voltage characteristics (IVC), and the pressure dependence of the activation energy in n-Si and n-Ge crystals in the region of strain-induced metal-insulator transition (MIT) is presented. A remarkable change of the effective mass of carriers in semiconductors caused by strain-induced transformation of the energy band structure is the main necessary condition for realization of this kind of metal-nonmetal transition. en
heal.publisher WILEY-V C H VERLAG GMBH en
heal.journalName Physica Status Solidi (B) Basic Research en
dc.identifier.doi 10.1002/1521-3951(200101)223:2<519::AID-PSSB519>3.0.CO;2-I en
dc.identifier.isi ISI:000166961300028 en
dc.identifier.volume 223 en
dc.identifier.issue 2 en
dc.identifier.spage 519 en
dc.identifier.epage 523 en


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