Dilute aqueous base developable resists for environmentally friendly and biocompatible processes

Diakoumakos, CD; Douvas, A; Raptis, I; Kakabakos, S; Dimotikalli, D; Terzoudi, G; Argitis, P

dc.contributor.author	Diakoumakos, CD	en
dc.contributor.author	Douvas, A	en
dc.contributor.author	Raptis, I	en
dc.contributor.author	Kakabakos, S	en
dc.contributor.author	Dimotikalli, D	en
dc.contributor.author	Terzoudi, G	en
dc.contributor.author	Argitis, P	en
dc.date.accessioned	2014-03-01T01:17:43Z
dc.date.available	2014-03-01T01:17:43Z
dc.date.issued	2002	en
dc.identifier.issn	0167-9317	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/14637
dc.subject	biocompatible photoresists	en
dc.subject	protein patterning	en
dc.subject	chemically amplified photoresists	en
dc.subject	dilute aqueous TMAH developers	en
dc.subject	environmentally friendly processing	en
dc.subject	(meth)acrylate photoresists	en
dc.subject.classification	Engineering, Electrical & Electronic	en
dc.subject.classification	Nanoscience & Nanotechnology	en
dc.subject.classification	Optics	en
dc.subject.classification	Physics, Applied	en
dc.title	Dilute aqueous base developable resists for environmentally friendly and biocompatible processes	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0167-9317(02)00451-3	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0167-9317(02)00451-3	en
heal.language	English	en
heal.publicationDate	2002	en
heal.abstract	Photoresists developable in dilute aqueous bases are introduced for environmentally friendly photoresist processing and biopatterning. The proposed photoresists are of positive or negative tone, chemically amplified, based on synthesized (meth)acrylate copolymers bearing either pendant t-butyl ester group or 2-hydroxylethyl ester group for positive and negative imaging, respectively. Characteristic high-resolution lithographic results (0.13 mum lines) obtained with a positive (meth)acrylate-based chemically amplified resist formulation upon development with 13 x 10(-3) M TMAH solution are presented. On the other hand, a slightly modified resist formulation was used for biomolecule patterning under biocompatible conditions and protein microstructures (<10 mum equally spaced lines) are demonstrated. (C) 2002 Elsevier Science B.V. All rights reserved.	en
heal.publisher	ELSEVIER SCIENCE BV	en
heal.journalName	MICROELECTRONIC ENGINEERING	en
dc.identifier.doi	10.1016/S0167-9317(02)00451-3	en
dc.identifier.isi	ISI:000176594700113	en
dc.identifier.volume	61-2	en
dc.identifier.spage	819	en
dc.identifier.epage	827	en