Rotatable magnetron sputtering of YBa2Cu3O7-x thin films on single crystal substrates

De Roeck, I; De Winter, G; Van Paemel, R; De Gryse, R; Denul, J; Van Driessche, I; Bruneel, E; Hoste, S; Georgiopoulos, E; Andreouli, C; Tsetsekou, A

dc.contributor.author	De Roeck, I	en
dc.contributor.author	De Winter, G	en
dc.contributor.author	Van Paemel, R	en
dc.contributor.author	De Gryse, R	en
dc.contributor.author	Denul, J	en
dc.contributor.author	Van Driessche, I	en
dc.contributor.author	Bruneel, E	en
dc.contributor.author	Hoste, S	en
dc.contributor.author	Georgiopoulos, E	en
dc.contributor.author	Andreouli, C	en
dc.contributor.author	Tsetsekou, A	en
dc.date.accessioned	2014-03-01T01:18:19Z
dc.date.available	2014-03-01T01:18:19Z
dc.date.issued	2002	en
dc.identifier.issn	0921-4534	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/14930
dc.subject	Large scale	en
dc.subject	Rotatable magnetron	en
dc.subject	Single crystal	en
dc.subject	YBCO deposition	en
dc.subject.classification	Physics, Applied	en
dc.subject.other	Electric discharges	en
dc.subject.other	Magnesia	en
dc.subject.other	Magnetron sputtering	en
dc.subject.other	Oxide superconductors	en
dc.subject.other	Plasma spraying	en
dc.subject.other	Single crystals	en
dc.subject.other	Sputter deposition	en
dc.subject.other	Substrates	en
dc.subject.other	X ray diffraction analysis	en
dc.subject.other	Yttrium barium copper oxides	en
dc.subject.other	Rotatable magnetron sputtering	en
dc.subject.other	Thin films	en
dc.title	Rotatable magnetron sputtering of YBa2Cu3O7-x thin films on single crystal substrates	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0921-4534(02)00844-4	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0921-4534(02)00844-4	en
heal.language	English	en
heal.publicationDate	2002	en
heal.abstract	The development of sputter deposition of YBa2Cu3O7-x (YBCO) from rotatable targets is an important step in the realisation of a large scale deposition process for YBCO coated conductor. Rotatable magnetron sputter sources are standard equipment in large scale sputter industry and the power input in a rotatable magnetron can be much higher compared to a planar magnetron with the same race track area. This result in improved discharge characteristics and increased deposition speed, For this work a flame sprayed and a plasma sprayed cylindrical YBCO target was used to deposit YBCO thin films on single crystal MgO, c-Axis oriented YBCO thin films were obtained at lower pressure than is normally used for YBCO sputter deposition, resulting in a higher deposition speed. The influence of deposition parameters (such as sputter pressure oxygen partial pressure. substrate temperature. etc.) on the properties of the YBCO layer was investigated and the possibilities for large scale deposition were explored, (C) 2002 Elsevier Science B.V. All rights reserved.	en
heal.publisher	ELSEVIER SCIENCE BV	en
heal.journalName	Physica C: Superconductivity and its Applications	en
dc.identifier.doi	10.1016/S0921-4534(02)00844-4	en
dc.identifier.isi	ISI:000178018800125	en
dc.identifier.volume	372-376	en
dc.identifier.issue	PART 2	en
dc.identifier.spage	1067	en
dc.identifier.epage	1070	en