dc.contributor.author |
Kontos, AG |
en |
dc.contributor.author |
Raptis, YS |
en |
dc.contributor.author |
Strassburg, M |
en |
dc.contributor.author |
Pohl, UW |
en |
dc.date.accessioned |
2014-03-01T01:18:57Z |
|
dc.date.available |
2014-03-01T01:18:57Z |
|
dc.date.issued |
2003 |
en |
dc.identifier.issn |
0022-0248 |
en |
dc.identifier.uri |
https://dspace.lib.ntua.gr/xmlui/handle/123456789/15279 |
|
dc.subject |
A1. Characterization |
en |
dc.subject |
A1. Raman |
en |
dc.subject |
A1. Stresses |
en |
dc.subject |
A1. X-ray diffraction |
en |
dc.subject |
A3. Metalorganic vapor phase epitaxy |
en |
dc.subject |
B1. Tellurites |
en |
dc.subject |
B2. Semiconductor ternary compounds |
en |
dc.subject.classification |
Crystallography |
en |
dc.subject.other |
Crystal structure |
en |
dc.subject.other |
Lattice constants |
en |
dc.subject.other |
Raman scattering |
en |
dc.subject.other |
Relaxation processes |
en |
dc.subject.other |
Semiconducting indium phosphide |
en |
dc.subject.other |
Semiconducting zinc compounds |
en |
dc.subject.other |
Stoichiometry |
en |
dc.subject.other |
Strain |
en |
dc.subject.other |
Substrates |
en |
dc.subject.other |
X ray diffraction analysis |
en |
dc.subject.other |
Plastic strain |
en |
dc.subject.other |
Epitaxial growth |
en |
dc.title |
Epitaxy and structural characterization of ZnSeTe layers grown on InP substrates |
en |
heal.type |
journalArticle |
en |
heal.identifier.primary |
10.1016/S0022-0248(02)01904-8 |
en |
heal.identifier.secondary |
http://dx.doi.org/10.1016/S0022-0248(02)01904-8 |
en |
heal.language |
English |
en |
heal.publicationDate |
2003 |
en |
heal.abstract |
ZnSeTe epilayers were grown on InP substrates with and without ZnCdSe buffer layers. Structural X-ray and Raman characterization results indicate a large range of Se composition in the epilayers. The introduction of a buffer layer and the control of the growth conditions improve the structure by limiting compositional variations close to the stoichiometric value where lattice matching conditions are met. Effects of plastic strain relaxation are thereby minimized. (C) 2002 Elsevier Science B.V. All rights reserved. |
en |
heal.publisher |
ELSEVIER SCIENCE BV |
en |
heal.journalName |
Journal of Crystal Growth |
en |
dc.identifier.doi |
10.1016/S0022-0248(02)01904-8 |
en |
dc.identifier.isi |
ISI:000180078300003 |
en |
dc.identifier.volume |
247 |
en |
dc.identifier.issue |
1-2 |
en |
dc.identifier.spage |
17 |
en |
dc.identifier.epage |
22 |
en |