Evaluation of poly(hydroxyethyl methacrylate) imaging chemistries for micropatterning applications

Vasilopoulou, M; Boyatzis, S; Raptis, I; Dimotikalli, D; Argitis, P

dc.contributor.author	Vasilopoulou, M	en
dc.contributor.author	Boyatzis, S	en
dc.contributor.author	Raptis, I	en
dc.contributor.author	Dimotikalli, D	en
dc.contributor.author	Argitis, P	en
dc.date.accessioned	2014-03-01T01:20:25Z
dc.date.available	2014-03-01T01:20:25Z
dc.date.issued	2004	en
dc.identifier.issn	0959-9428	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/15914
dc.subject.classification	Chemistry, Physical	en
dc.subject.classification	Materials Science, Multidisciplinary	en
dc.subject.other	Biomaterials	en
dc.subject.other	Crosslinking	en
dc.subject.other	Esterification	en
dc.subject.other	Fourier transform infrared spectroscopy	en
dc.subject.other	Optical resolving power	en
dc.subject.other	Reaction kinetics	en
dc.subject.other	Solutions	en
dc.subject.other	Ultraviolet radiation	en
dc.subject.other	Ultraviolet spectroscopy	en
dc.subject.other	Chain scission mechanism	en
dc.subject.other	Electron beam radiation	en
dc.subject.other	Micropatterning	en
dc.subject.other	Photo-acid generators	en
dc.subject.other	Acrylic monomers	en
dc.subject.other	biomaterial	en
dc.subject.other	polymacon	en
dc.subject.other	aqueous solution	en
dc.subject.other	article	en
dc.subject.other	chemical reaction	en
dc.subject.other	chemical structure	en
dc.subject.other	cross linking	en
dc.subject.other	electron beam	en
dc.subject.other	imaging system	en
dc.subject.other	infrared spectroscopy	en
dc.subject.other	reaction analysis	en
dc.subject.other	sensitivity analysis	en
dc.subject.other	transesterification	en
dc.subject.other	ultraviolet radiation	en
dc.subject.other	ultraviolet spectroscopy	en
dc.title	Evaluation of poly(hydroxyethyl methacrylate) imaging chemistries for micropatterning applications	en
heal.type	journalArticle	en
heal.identifier.primary	10.1039/b407485h	en
heal.identifier.secondary	http://dx.doi.org/10.1039/b407485h	en
heal.language	English	en
heal.publicationDate	2004	en
heal.abstract	Chemical reactions leading to imaging of poly(2-hydroxyethyl methacrylate) (PHEMA) based materials are investigated. Positive imaging is obtained upon exposure to deep UV and electron beam radiation following a chain scission mechanism. The presence of the OH group adds the possibility of development in alkaline aqueous solutions with considerably higher sensitivities than in the case of PMMA. On the other hand, negative tone lithography can be achieved with the addition of photo-acid generators that induce crosslinking, arising mainly from transesterification reactions. Reaction mechanisms have been investigated mostly by MS studies supported by FTIR and UV spectroscopies. Micropatterning characteristics for deep UV and electron beam radiation have also been evaluated. Submicron patterning capabilities are demonstrated for both positive and negative imaging although higher resolution is hindered by strong swelling phenomena during development. Nevertheless, specific patterning applications including novel schemes for use in biomaterials and microsystems are anticipated.	en
heal.publisher	ROYAL SOC CHEMISTRY	en
heal.journalName	Journal of Materials Chemistry	en
dc.identifier.doi	10.1039/b407485h	en
dc.identifier.isi	ISI:000224963600006	en
dc.identifier.volume	14	en
dc.identifier.issue	22	en
dc.identifier.spage	3312	en
dc.identifier.epage	3320	en