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Influence of pulsed laser deposition (PLD) parameters on the H2 sensing properties of zinc oxide thin films

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dc.contributor.author Brilis, N en
dc.contributor.author Romesis, P en
dc.contributor.author Tsamakis, D en
dc.contributor.author Kompitsas, M en
dc.date.accessioned 2014-03-01T01:22:31Z
dc.date.available 2014-03-01T01:22:31Z
dc.date.issued 2005 en
dc.identifier.issn 0749-6036 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/16599
dc.subject On-line Control en
dc.subject Pulsed Laser Deposition en
dc.subject Thin Film en
dc.subject Zinc Oxide en
dc.subject zno thin film en
dc.subject.classification Physics, Condensed Matter en
dc.subject.other Gold en
dc.subject.other Nanostructured materials en
dc.subject.other Temperature distribution en
dc.subject.other Thin films en
dc.subject.other Zinc oxide en
dc.subject.other Deposition parameters en
dc.subject.other Film properties en
dc.subject.other Laser parameters en
dc.subject.other Pulsed laser deposition en
dc.title Influence of pulsed laser deposition (PLD) parameters on the H2 sensing properties of zinc oxide thin films en
heal.type journalArticle en
heal.identifier.primary 10.1016/j.spmi.2005.08.003 en
heal.identifier.secondary http://dx.doi.org/10.1016/j.spmi.2005.08.003 en
heal.language English en
heal.publicationDate 2005 en
heal.abstract Thin films of n-type ZnO were produced by a novel two-target, two-pulsed laser deposition technique. This method allows on-line control of the film properties by just changing the laser parameters. A number of deposition parameters, as well as the dopants (Al, Au) and the substrate type (Si, SiO2, glass), were changed. The sensing properties of the films were tested upon exposure to a H-2 flow in air ambient at working temperatures between 150 and 210 degrees C. Undoped ZnO thin films. deposited on SiO2 substrates at 200 degrees C, in ambient O-2 at 20 Pa and with a laser fluence of 9.6 J/cm(3), exhibited a maximum sensitivity (Delta R/R-0) higher than 97% and a response time lower than 3 min at the working temperature 180 degrees C. Decrease of the working temperature to 150 degrees C was achieved by means of surface sensitization of films after deposition of Au nanoclusters on the surface of the above-mentioned ZnO thin films. (C) 2005 Elsevier Ltd. All rights reserved. en
heal.publisher ACADEMIC PRESS LTD ELSEVIER SCIENCE LTD en
heal.journalName Superlattices and Microstructures en
dc.identifier.doi 10.1016/j.spmi.2005.08.003 en
dc.identifier.isi ISI:000233651800008 en
dc.identifier.volume 38 en
dc.identifier.issue 4-6 en
dc.identifier.spage 283 en
dc.identifier.epage 290 en


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