An experimental and computational analysis of a MOCVD process for the growth of Al films using DMEAA

Xenidou, TC; Boudouvis, AG; Markatos, NC; Samelor, D; Senocq, F; PrudHomme, N; Vahlas, C

dc.contributor.author	Xenidou, TC	en
dc.contributor.author	Boudouvis, AG	en
dc.contributor.author	Markatos, NC	en
dc.contributor.author	Samelor, D	en
dc.contributor.author	Senocq, F	en
dc.contributor.author	PrudHomme, N	en
dc.contributor.author	Vahlas, C	en
dc.date.accessioned	2014-03-01T01:25:53Z
dc.date.available	2014-03-01T01:25:53Z
dc.date.issued	2007	en
dc.identifier.issn	0257-8972	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/17800
dc.subject	Aluminum	en
dc.subject	Computational fluid dynamics	en
dc.subject	DMEAA	en
dc.subject	MOCVD process	en
dc.subject.classification	Materials Science, Coatings & Films	en
dc.subject.classification	Physics, Applied	en
dc.subject.other	Aluminum	en
dc.subject.other	Computational fluid dynamics	en
dc.subject.other	Computer simulation	en
dc.subject.other	Finite volume method	en
dc.subject.other	Hydrodynamics	en
dc.subject.other	Thermodynamic properties	en
dc.subject.other	Aluminum coatings	en
dc.subject.other	Dimethylethylamine alane	en
dc.subject.other	Metallorganic chemical vapor deposition	en
dc.subject.other	Aluminum	en
dc.subject.other	Computational fluid dynamics	en
dc.subject.other	Computer simulation	en
dc.subject.other	Finite volume method	en
dc.subject.other	Hydrodynamics	en
dc.subject.other	Metallorganic chemical vapor deposition	en
dc.subject.other	Thermodynamic properties	en
dc.title	An experimental and computational analysis of a MOCVD process for the growth of Al films using DMEAA	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/j.surfcoat.2007.04.080	en
heal.identifier.secondary	http://dx.doi.org/10.1016/j.surfcoat.2007.04.080	en
heal.language	English	en
heal.publicationDate	2007	en
heal.abstract	The analysis of a metal-organic chemical vapor deposition (MOCVD) process is performed by combining computational fluid dynamics (CFD) simulations and experimental measurements. The analysis is applied to a vertical, cold-wall reactor, where aluminum coatings are grown from dimethylethylamine alane (DMEAA), under low-pressure conditions. A two-dimensional model, based on the finite-volume method, is developed to predict the thermal and hydrodynamic characteristics of the flow within the MOCVD reactor, and the simulation results are compared with experimental data. It is shown that the computational predictions of the growth rates are in fair agreement with the experimental measurements. (c) 2007 Elsevier B.V. All rights reserved.	en
heal.publisher	ELSEVIER SCIENCE SA	en
heal.journalName	Surface and Coatings Technology	en
dc.identifier.doi	10.1016/j.surfcoat.2007.04.080	en
dc.identifier.isi	ISI:000249340400014	en
dc.identifier.volume	201	en
dc.identifier.issue	22-23 SPEC. ISS.	en
dc.identifier.spage	8868	en
dc.identifier.epage	8872	en