dc.contributor.author |
Brilis, N |
en |
dc.contributor.author |
Foukaraki, C |
en |
dc.contributor.author |
Bourithis, E |
en |
dc.contributor.author |
Tsamakis, D |
en |
dc.contributor.author |
Giannoudakos, A |
en |
dc.contributor.author |
Kompitsas, M |
en |
dc.contributor.author |
Xenidou, T |
en |
dc.contributor.author |
Boudouvis, A |
en |
dc.date.accessioned |
2014-03-01T01:26:08Z |
|
dc.date.available |
2014-03-01T01:26:08Z |
|
dc.date.issued |
2007 |
en |
dc.identifier.issn |
0040-6090 |
en |
dc.identifier.uri |
https://dspace.lib.ntua.gr/xmlui/handle/123456789/17933 |
|
dc.subject |
Au surface sensitization |
en |
dc.subject |
Hydrogen sensing |
en |
dc.subject |
Nickel oxide |
en |
dc.subject |
P-N hetero-junctions |
en |
dc.subject |
Thin films |
en |
dc.subject |
Tin oxide |
en |
dc.subject.classification |
Materials Science, Multidisciplinary |
en |
dc.subject.classification |
Materials Science, Coatings & Films |
en |
dc.subject.classification |
Physics, Applied |
en |
dc.subject.classification |
Physics, Condensed Matter |
en |
dc.subject.other |
Chemical sensors |
en |
dc.subject.other |
Molecular structure |
en |
dc.subject.other |
Oxide films |
en |
dc.subject.other |
Pulsed laser deposition |
en |
dc.subject.other |
Schottky barrier diodes |
en |
dc.subject.other |
Thermal effects |
en |
dc.subject.other |
Deposition temperature |
en |
dc.subject.other |
Gold surface sensitization |
en |
dc.subject.other |
Hydrogen sensing |
en |
dc.subject.other |
P-N hetero-junctions |
en |
dc.subject.other |
Thin films |
en |
dc.title |
Development of NiO-based thin film structures as efficient H2 gas sensors operating at room temperatures |
en |
heal.type |
journalArticle |
en |
heal.identifier.primary |
10.1016/j.tsf.2007.03.147 |
en |
heal.identifier.secondary |
http://dx.doi.org/10.1016/j.tsf.2007.03.147 |
en |
heal.language |
English |
en |
heal.publicationDate |
2007 |
en |
heal.abstract |
P-type NiO thin films have been developed on high resistivity Si and SiO2 substrates by a pulsed laser deposition technique using an ArF* 193 nm excimer laser at deposition temperature of 300 degrees C and in 40 Pa partial oxygen pressure. Structures based on such NiO films as host material in the form of Au-NiO Schottky diodes have been subsequently developed under vacuum. In a different procedure, an n-SnO2 layer has been deposited by a CVD technique on a NiO film to produce a p/n heterojunction. The sensing properties of all above structures have been tested upon exposure to a H-2 flow in air ambient gas at various operating temperature ranging from 30 to 180 degrees C. For the NiO films, the optimum temperature was about 150 degrees C exhibiting a sensitivity of 94%. After surface sensitization of NiO by An the NiO films showed an H, response at operating temperature of 30 degrees C. The sensitivity of p-NiO/n-SnO2 heterojunction devices was extracted from I-V measurements in air and under H-2 flow mixed in air. In this case a dramatic increase of the sensitivity was achieved at operating temperature of 30 degrees C for a forward bias of 0,2 V. (c) 2007 Elsevier B.V. All rights reserved. |
en |
heal.publisher |
ELSEVIER SCIENCE SA |
en |
heal.journalName |
Thin Solid Films |
en |
dc.identifier.doi |
10.1016/j.tsf.2007.03.147 |
en |
dc.identifier.isi |
ISI:000250497000012 |
en |
dc.identifier.volume |
515 |
en |
dc.identifier.issue |
24 SPEC. ISS. |
en |
dc.identifier.spage |
8484 |
en |
dc.identifier.epage |
8489 |
en |