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Development of NiO-based thin film structures as efficient H2 gas sensors operating at room temperatures

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dc.contributor.author Brilis, N en
dc.contributor.author Foukaraki, C en
dc.contributor.author Bourithis, E en
dc.contributor.author Tsamakis, D en
dc.contributor.author Giannoudakos, A en
dc.contributor.author Kompitsas, M en
dc.contributor.author Xenidou, T en
dc.contributor.author Boudouvis, A en
dc.date.accessioned 2014-03-01T01:26:08Z
dc.date.available 2014-03-01T01:26:08Z
dc.date.issued 2007 en
dc.identifier.issn 0040-6090 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/17933
dc.subject Au surface sensitization en
dc.subject Hydrogen sensing en
dc.subject Nickel oxide en
dc.subject P-N hetero-junctions en
dc.subject Thin films en
dc.subject Tin oxide en
dc.subject.classification Materials Science, Multidisciplinary en
dc.subject.classification Materials Science, Coatings & Films en
dc.subject.classification Physics, Applied en
dc.subject.classification Physics, Condensed Matter en
dc.subject.other Chemical sensors en
dc.subject.other Molecular structure en
dc.subject.other Oxide films en
dc.subject.other Pulsed laser deposition en
dc.subject.other Schottky barrier diodes en
dc.subject.other Thermal effects en
dc.subject.other Deposition temperature en
dc.subject.other Gold surface sensitization en
dc.subject.other Hydrogen sensing en
dc.subject.other P-N hetero-junctions en
dc.subject.other Thin films en
dc.title Development of NiO-based thin film structures as efficient H2 gas sensors operating at room temperatures en
heal.type journalArticle en
heal.identifier.primary 10.1016/j.tsf.2007.03.147 en
heal.identifier.secondary http://dx.doi.org/10.1016/j.tsf.2007.03.147 en
heal.language English en
heal.publicationDate 2007 en
heal.abstract P-type NiO thin films have been developed on high resistivity Si and SiO2 substrates by a pulsed laser deposition technique using an ArF* 193 nm excimer laser at deposition temperature of 300 degrees C and in 40 Pa partial oxygen pressure. Structures based on such NiO films as host material in the form of Au-NiO Schottky diodes have been subsequently developed under vacuum. In a different procedure, an n-SnO2 layer has been deposited by a CVD technique on a NiO film to produce a p/n heterojunction. The sensing properties of all above structures have been tested upon exposure to a H-2 flow in air ambient gas at various operating temperature ranging from 30 to 180 degrees C. For the NiO films, the optimum temperature was about 150 degrees C exhibiting a sensitivity of 94%. After surface sensitization of NiO by An the NiO films showed an H, response at operating temperature of 30 degrees C. The sensitivity of p-NiO/n-SnO2 heterojunction devices was extracted from I-V measurements in air and under H-2 flow mixed in air. In this case a dramatic increase of the sensitivity was achieved at operating temperature of 30 degrees C for a forward bias of 0,2 V. (c) 2007 Elsevier B.V. All rights reserved. en
heal.publisher ELSEVIER SCIENCE SA en
heal.journalName Thin Solid Films en
dc.identifier.doi 10.1016/j.tsf.2007.03.147 en
dc.identifier.isi ISI:000250497000012 en
dc.identifier.volume 515 en
dc.identifier.issue 24 SPEC. ISS. en
dc.identifier.spage 8484 en
dc.identifier.epage 8489 en


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