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A new concept for the collection of an electron beam configured by an externally applied axial magnetic field

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dc.contributor.author Pagonakis, IGr en
dc.contributor.author Hogge, J-P en
dc.contributor.author Alberti, S en
dc.contributor.author Avramides, KA en
dc.contributor.author Vomvoridis, JL en
dc.date.accessioned 2014-03-01T01:27:44Z
dc.date.available 2014-03-01T01:27:44Z
dc.date.issued 2008 en
dc.identifier.issn 0093-3813 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/18560
dc.subject Collector design en
dc.subject Electron beam en
dc.subject Gyrotron en
dc.subject Multistage depressed collector en
dc.subject.classification Physics, Fluids & Plasmas en
dc.subject.other Computer simulation en
dc.subject.other Fusion reactors en
dc.subject.other Gyrotrons en
dc.subject.other Magnetic fields en
dc.subject.other Plasmas en
dc.subject.other Axial magnetic field en
dc.subject.other Collector design en
dc.subject.other Collector efficiency en
dc.subject.other Collector wall en
dc.subject.other Multistage depressed collector en
dc.subject.other Electron beams en
dc.title A new concept for the collection of an electron beam configured by an externally applied axial magnetic field en
heal.type journalArticle en
heal.identifier.primary 10.1109/TPS.2008.917943 en
heal.identifier.secondary http://dx.doi.org/10.1109/TPS.2008.917943 en
heal.language English en
heal.publicationDate 2008 en
heal.abstract A new concept for the collection of an electron beam, which is configured by an externally applied axial magnetic field, is presented. The two major advantages of this new idea are the significant increase of the collector efficiency and the reduction of the power absorption on the collector wall. To demonstrate the concept, an indicative collector design has been prepared for the hollow electron beam of the European 170-GHz 2-MW coaxial gyrotron for the International Thermonuclear Experimental Reactor. The simulation shows that the efficiency of this advanced collector is more than 90%. © 2008 IEEE. en
heal.publisher IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC en
heal.journalName IEEE Transactions on Plasma Science en
dc.identifier.doi 10.1109/TPS.2008.917943 en
dc.identifier.isi ISI:000254981800003 en
dc.identifier.volume 36 en
dc.identifier.issue 2 PART 2 en
dc.identifier.spage 469 en
dc.identifier.epage 480 en


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