Nickel oxide thin films synthesized by reactive pulsed laser deposition: Characterization and application to hydrogen sensing

Fasaki, I; Giannoudakos, A; Stamataki, M; Kompitsas, M; Gyorgy, E; Mihailescu, IN; Roubani-Kalantzopoulou, F; Lagoyannis, A; Harissopulos, S

dc.contributor.author	Fasaki, I	en
dc.contributor.author	Giannoudakos, A	en
dc.contributor.author	Stamataki, M	en
dc.contributor.author	Kompitsas, M	en
dc.contributor.author	Gyorgy, E	en
dc.contributor.author	Mihailescu, IN	en
dc.contributor.author	Roubani-Kalantzopoulou, F	en
dc.contributor.author	Lagoyannis, A	en
dc.contributor.author	Harissopulos, S	en
dc.date.accessioned	2014-03-01T01:28:51Z
dc.date.available	2014-03-01T01:28:51Z
dc.date.issued	2008	en
dc.identifier.issn	0947-8396	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/18999
dc.subject	Excimer Laser	en
dc.subject	Nickel Oxide	en
dc.subject	Optical Properties	en
dc.subject	Pulsed Laser Deposition	en
dc.subject	Room Temperature	en
dc.subject	Surface Morphology	en
dc.subject	Thin Film	en
dc.subject	Heat Treatment	en
dc.subject.classification	Materials Science, Multidisciplinary	en
dc.subject.classification	Physics, Applied	en
dc.subject.other	Excimer lasers	en
dc.subject.other	Film growth	en
dc.subject.other	Hydrogen	en
dc.subject.other	Nickel oxide	en
dc.subject.other	Pulsed laser deposition	en
dc.subject.other	Surface morphology	en
dc.subject.other	Synthesis (chemical)	en
dc.subject.other	Hydrogen sensing	en
dc.subject.other	Laser sources	en
dc.subject.other	Oxygen deficiencies	en
dc.subject.other	Thin films	en
dc.title	Nickel oxide thin films synthesized by reactive pulsed laser deposition: Characterization and application to hydrogen sensing	en
heal.type	journalArticle	en
heal.identifier.primary	10.1007/s00339-008-4435-0	en
heal.identifier.secondary	http://dx.doi.org/10.1007/s00339-008-4435-0	en
heal.language	English	en
heal.publicationDate	2008	en
heal.abstract	Transparent nickel oxide thin films were grown by reactive pulsed laser deposition. An ArF* (lambda = 193 nm, tau = 12 ns) excimer laser source was used to ablate the Ni targets in a controlled pressure of ambient oxygen. The substrates were either kept at room temperature or heated to a selected temperature within the 200-400 degrees C range. Post-deposition heat treatment, which was applied to further promote crystallization and overcome any oxygen deficiency, yielded transparent thin films. The surface morphology and crystalline status of the synthesized thin structures were analyzed in correlation with their optical properties. A significant response to several concentrations of hydrogen was demonstrated when heating the nickel oxide films at 185 degrees C.	en
heal.publisher	SPRINGER	en
heal.journalName	Applied Physics A: Materials Science and Processing	en
dc.identifier.doi	10.1007/s00339-008-4435-0	en
dc.identifier.isi	ISI:000255089300023	en
dc.identifier.volume	91	en
dc.identifier.issue	3	en
dc.identifier.spage	487	en
dc.identifier.epage	492	en