Plasma processing for polymeric microfluidics fabrication and surface modification: Effect of super-hydrophobic walls on electroosmotic flow

Vourdas, N; Tserepi, A; Boudouvis, AG; Gogolides, E

dc.contributor.author	Vourdas, N	en
dc.contributor.author	Tserepi, A	en
dc.contributor.author	Boudouvis, AG	en
dc.contributor.author	Gogolides, E	en
dc.date.accessioned	2014-03-01T01:29:00Z
dc.date.available	2014-03-01T01:29:00Z
dc.date.issued	2008	en
dc.identifier.issn	0167-9317	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/19079
dc.subject	Electroosmotic flow	en
dc.subject	Flow in superhydrophobic channels	en
dc.subject	Microfluidics	en
dc.subject	Plasma etching	en
dc.subject	PMMA	en
dc.subject	Superhydrophilic	en
dc.subject	Superhydrophobic	en
dc.subject.classification	Engineering, Electrical & Electronic	en
dc.subject.classification	Nanoscience & Nanotechnology	en
dc.subject.classification	Optics	en
dc.subject.classification	Physics, Applied	en
dc.subject.other	Electroosmosis	en
dc.subject.other	Plasma etching	en
dc.subject.other	Polydimethylsiloxane	en
dc.subject.other	Polymethyl methacrylates	en
dc.subject.other	Surface treatment	en
dc.subject.other	Electroosmotic flow	en
dc.subject.other	Flow in superhydrophobic channels	en
dc.subject.other	Superhydrophilicity	en
dc.subject.other	Superhydrophobicity	en
dc.subject.other	Microfluidics	en
dc.title	Plasma processing for polymeric microfluidics fabrication and surface modification: Effect of super-hydrophobic walls on electroosmotic flow	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/j.mee.2007.12.032	en
heal.identifier.secondary	http://dx.doi.org/10.1016/j.mee.2007.12.032	en
heal.language	English	en
heal.publicationDate	2008	en
heal.abstract	We report on the fabrication and electrokinetic characterization of poly-methyl methacrylate (PMMA) microfluidics by deep O-2 plasma etching, utilizing a photosensitive poly-(dimethyl siloxane) (PDMS) as a resist (in situ mask). The mass production amenability, the high throughput without the use of mold, the dry character along with the flexibility to control surface properties towards specific demands are some of the advantages of this method. Intense ion bombardment ensures high etch rates (similar to 1.5 mu m/min) and anisotropy. A PMMA lid was thermally bonded to the plasma fabricated microchannel under 1.8 kg/cm(2) at 120 degrees C. Surface roughness and hydrophilization are some unique features induced by plasma processing, affecting the electrokinetic performance of the microfluidic and resulting in relatively high electroosmotic flow (EOF) mobilities of 2.83 x 10(-4) cm(2)/V s. Teflon-like coating deposition on the engraved part modified the surface into a super-hydrophobic and resulted in even higher EOF mobility (3.89 x 10-4 cm(2)/V S), thus proposing an alternative means in microfluidic surface modification and EOF control. (C) 2007 Elsevier B.V. All rights reserved.	en
heal.publisher	ELSEVIER SCIENCE BV	en
heal.journalName	Microelectronic Engineering	en
dc.identifier.doi	10.1016/j.mee.2007.12.032	en
dc.identifier.isi	ISI:000257413400097	en
dc.identifier.volume	85	en
dc.identifier.issue	5-6	en
dc.identifier.spage	1124	en
dc.identifier.epage	1127	en