Annealing effects on the structural, electrical and H2 sensing properties of transparent ZnO thin films, grown by pulsed laser deposition

Stamataki, M; Fasaki, I; Tsonos, G; Tsamakis, D; Kompitsas, M

dc.contributor.author	Stamataki, M	en
dc.contributor.author	Fasaki, I	en
dc.contributor.author	Tsonos, G	en
dc.contributor.author	Tsamakis, D	en
dc.contributor.author	Kompitsas, M	en
dc.date.accessioned	2014-03-01T01:29:51Z
dc.date.available	2014-03-01T01:29:51Z
dc.date.issued	2009	en
dc.identifier.issn	0040-6090	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/19378
dc.subject	Atomic force microscopy (AFM)	en
dc.subject	Hall effect	en
dc.subject	Heat treatment	en
dc.subject	Hydrogen	en
dc.subject	Pulsed laser deposition (PLD)	en
dc.subject	Sensors	en
dc.subject	Structural properties	en
dc.subject	Zinc oxide (ZnO)	en
dc.subject.classification	Materials Science, Multidisciplinary	en
dc.subject.classification	Materials Science, Coatings & Films	en
dc.subject.classification	Physics, Applied	en
dc.subject.classification	Physics, Condensed Matter	en
dc.subject.other	Annealing effects	en
dc.subject.other	Atomic force microscopy (AFM)	en
dc.subject.other	Constant temperature	en
dc.subject.other	Crystallinities	en
dc.subject.other	Deposition technique	en
dc.subject.other	Gas sensing characteristics	en
dc.subject.other	Hydrogen concentration	en
dc.subject.other	Operating temperature	en
dc.subject.other	Oxygen deficiency	en
dc.subject.other	Post annealing	en
dc.subject.other	Postdeposition heat treatment	en
dc.subject.other	Reactive pulsed laser deposition	en
dc.subject.other	Sensing property	en
dc.subject.other	Structural investigation	en
dc.subject.other	Transparent thin film	en
dc.subject.other	Zinc oxide thin films	en
dc.subject.other	ZnO	en
dc.subject.other	ZnO thin film	en
dc.subject.other	Annealing	en
dc.subject.other	Atomic force microscopy	en
dc.subject.other	Atoms	en
dc.subject.other	Deposition	en
dc.subject.other	Gas sensing electrodes	en
dc.subject.other	Gyrators	en
dc.subject.other	Hall effect	en
dc.subject.other	Hydrogen	en
dc.subject.other	Lasers	en
dc.subject.other	Magnetic field effects	en
dc.subject.other	Oxygen	en
dc.subject.other	Programmable logic controllers	en
dc.subject.other	Pulsed laser deposition	en
dc.subject.other	Semiconducting zinc compounds	en
dc.subject.other	Sensors	en
dc.subject.other	Thermal effects	en
dc.subject.other	Thin films	en
dc.subject.other	X ray diffraction	en
dc.subject.other	X ray diffraction analysis	en
dc.subject.other	Zinc	en
dc.subject.other	Zinc oxide	en
dc.subject.other	Oxide films	en
dc.title	Annealing effects on the structural, electrical and H2 sensing properties of transparent ZnO thin films, grown by pulsed laser deposition	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/j.tsf.2009.02.156	en
heal.identifier.secondary	http://dx.doi.org/10.1016/j.tsf.2009.02.156	en
heal.language	English	en
heal.publicationDate	2009	en
heal.abstract	Transparent zinc oxide thin films were grown by reactive pulsed laser deposition on glass substrates. The substrates were kept at 200 degrees C constant temperature. Post-deposition heat treatment, applied to further promote crystallization and overcome any oxygen deficiency, yielded transparent thin films. Structural investigations carried out by atomic force microscopy (AFM) and X-ray diffraction (XRD), have shown a strong influence of deposition technique parameters and post-annealing on the crystallinity of the zinc oxide films. The gas sensing characteristics of these films were investigated towards different hydrogen concentrations (5000-30,000 ppm) at a selected operating temperature within the 150-230 degrees C range. (C) 2009 Elsevier B.V. All rights reserved.	en
heal.publisher	ELSEVIER SCIENCE SA	en
heal.journalName	Thin Solid Films	en
dc.identifier.doi	10.1016/j.tsf.2009.02.156	en
dc.identifier.isi	ISI:000272733200069	en
dc.identifier.volume	518	en
dc.identifier.issue	4	en
dc.identifier.spage	1326	en
dc.identifier.epage	1331	en