Effects of post-deposition surface treatment on the optical, structural and hydrogen sensing properties of TiO2 thin films

Fasaki, I; Hotovy, I; Rehakova, A; Hotovy, J; Rehacek, V; Kompitsas, M; Roubani-Kalantzopoulou, F

dc.contributor.author	Fasaki, I	en
dc.contributor.author	Hotovy, I	en
dc.contributor.author	Rehakova, A	en
dc.contributor.author	Hotovy, J	en
dc.contributor.author	Rehacek, V	en
dc.contributor.author	Kompitsas, M	en
dc.contributor.author	Roubani-Kalantzopoulou, F	en
dc.date.accessioned	2014-03-01T01:30:18Z
dc.date.available	2014-03-01T01:30:18Z
dc.date.issued	2009	en
dc.identifier.issn	0040-6090	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/19539
dc.subject	Hydrogen sensing	en
dc.subject	Metal modification	en
dc.subject	TiO2 thin films	en
dc.subject.classification	Materials Science, Multidisciplinary	en
dc.subject.classification	Materials Science, Coatings & Films	en
dc.subject.classification	Physics, Applied	en
dc.subject.classification	Physics, Condensed Matter	en
dc.subject.other	Anatase phase	en
dc.subject.other	Annealing temperatures	en
dc.subject.other	DC reactive magnetron sputtering	en
dc.subject.other	Glass substrates	en
dc.subject.other	High sensitivity	en
dc.subject.other	Hydrogen sensing	en
dc.subject.other	Hydrogen sensing properties	en
dc.subject.other	Operating temperature	en
dc.subject.other	Optical transmittance spectrum	en
dc.subject.other	Oxidized silicon substrates	en
dc.subject.other	Polycrystalline	en
dc.subject.other	Post deposition annealing	en
dc.subject.other	Post-deposition	en
dc.subject.other	Structural and morphological properties	en
dc.subject.other	Surface modification	en
dc.subject.other	Thin-film structure	en
dc.subject.other	TiO	en
dc.subject.other	TiO thin films	en
dc.subject.other	XRD patterns	en
dc.subject.other	Amorphous films	en
dc.subject.other	Argon	en
dc.subject.other	Glass	en
dc.subject.other	Hydrogen	en
dc.subject.other	Optical properties	en
dc.subject.other	Oxygen	en
dc.subject.other	Platinum	en
dc.subject.other	Silicon oxides	en
dc.subject.other	Substrates	en
dc.subject.other	Surface treatment	en
dc.subject.other	Titanium dioxide	en
dc.subject.other	Thin films	en
dc.title	Effects of post-deposition surface treatment on the optical, structural and hydrogen sensing properties of TiO2 thin films	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/j.tsf.2009.08.052	en
heal.identifier.secondary	http://dx.doi.org/10.1016/j.tsf.2009.08.052	en
heal.language	English	en
heal.publicationDate	2009	en
heal.abstract	TiO2 thin films were prepared by DC reactive magnetron sputtering in a mixture of oxygen and argon on glass and oxidized silicon substrates. The effect of post-deposition annealing (300 degrees C. 500 degrees C and 700 degrees C for 8 h in air) on the structural and morphological properties of TiO2 thin films is presented. In addition, the effect of Pt surface modification (1, 3 and 5 nm) on hydrogen sensing was studied. XRD patterns have shown that in the range of annealing temperatures from 300 degrees C to 500 degrees C crystallization starts and the thin film structure changes from amorphous to polycrystalline (anatase phase). In the case of samples on glass substrate, optical transmittance spectra were recorded. TiO2 thin films were tested as sensors of hydrogen at concentrations 10,000-1000 ppm and operating temperatures within the 180-200 degrees C range. The samples with 1 nm and in particular with 3 nm of Pt on the surface responded to hydrogen fast and with high sensitivity. (C) 2009 Elsevier B.V. All rights reserved.	en
heal.publisher	ELSEVIER SCIENCE SA	en
heal.journalName	Thin Solid Films	en
dc.identifier.doi	10.1016/j.tsf.2009.08.052	en
dc.identifier.isi	ISI:000272733200019	en
dc.identifier.volume	518	en
dc.identifier.issue	4	en
dc.identifier.spage	1103	en
dc.identifier.epage	1108	en