Electrodeposition of polycrystalline ZnTe from simple and citrate-complexed acidic aqueous solutions

Bouroushian, M; Kosanovic, T; Karoussos, D; Spyrellis, N

dc.contributor.author	Bouroushian, M	en
dc.contributor.author	Kosanovic, T	en
dc.contributor.author	Karoussos, D	en
dc.contributor.author	Spyrellis, N	en
dc.date.accessioned	2014-03-01T01:30:19Z
dc.date.available	2014-03-01T01:30:19Z
dc.date.issued	2009	en
dc.identifier.issn	0013-4686	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/19549
dc.subject	Citrate bath	en
dc.subject	II-VI chalcogenides	en
dc.subject	II-VI heterostructures	en
dc.subject	Pulse plating	en
dc.subject	ZnTe electrodeposition	en
dc.subject.classification	Electrochemistry	en
dc.subject.other	Cadmium alloys	en
dc.subject.other	Cadmium compounds	en
dc.subject.other	Chalcogenides	en
dc.subject.other	Crystals	en
dc.subject.other	Electroplating	en
dc.subject.other	Epitaxial films	en
dc.subject.other	Epitaxial growth	en
dc.subject.other	Fourier transform infrared spectroscopy	en
dc.subject.other	Heterojunctions	en
dc.subject.other	Semiconducting cadmium telluride	en
dc.subject.other	Semiconducting zinc compounds	en
dc.subject.other	Semiconductor growth	en
dc.subject.other	Stoichiometry	en
dc.subject.other	Zinc	en
dc.subject.other	Citrate bath	en
dc.subject.other	II-VI chalcogenides	en
dc.subject.other	II-VI heterostructures	en
dc.subject.other	Pulse plating	en
dc.subject.other	ZnTe electrodeposition	en
dc.subject.other	Substrates	en
dc.title	Electrodeposition of polycrystalline ZnTe from simple and citrate-complexed acidic aqueous solutions	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/j.electacta.2008.07.028	en
heal.identifier.secondary	http://dx.doi.org/10.1016/j.electacta.2008.07.028	en
heal.language	English	en
heal.publicationDate	2009	en
heal.abstract	The cathodic electrodeposition of polycrystalline zinc telluride from aqueous acidic solutions of zinc sulphate and tellurite, under constant or pulsing voltage, is described. Various compositions of the bath were tested with respect to the Zn/Te precursor ratio, including addition of citrate buffer as a complexation agent. Metallic (Ni and Ti) and semiconductor (CdTe and CdSe) electrodes were used as cathode-substrates. The deposits were characterized by XRD, SEM-EDX and FTIR techniques. The formation of compact barrier layers of zinc blend, stoichiometric ZnTe or mixed (Zn,Cd)Te was attained. Pulse plating in a citrate-free bath and constant potential plating from a citrate bath were seen to have the most beneficial effect on the properties of the electrodeposits, as leading to improved microstructure of the ZnTe films, in terms of crystallinity and stoichiometry. Further, the employment of [1 1 1]-oriented CdTe or CdSe substrates featured an epitaxial growth of polycrystalline ZnTe films as well as an improved Zn/Te atomic ratio compared to the metallic substrates. © 2008 Elsevier Ltd. All rights reserved.	en
heal.publisher	PERGAMON-ELSEVIER SCIENCE LTD	en
heal.journalName	Electrochimica Acta	en
dc.identifier.doi	10.1016/j.electacta.2008.07.028	en
dc.identifier.isi	ISI:000264743900019	en
dc.identifier.volume	54	en
dc.identifier.issue	9	en
dc.identifier.spage	2522	en
dc.identifier.epage	2528	en