Fabrication of gold nanoparticle lines based on fracture induced patterning

Tang, J; Kolliopoulou, S; Tsoukalas, D

dc.contributor.author	Tang, J	en
dc.contributor.author	Kolliopoulou, S	en
dc.contributor.author	Tsoukalas, D	en
dc.date.accessioned	2014-03-01T01:30:31Z
dc.date.available	2014-03-01T01:30:31Z
dc.date.issued	2009	en
dc.identifier.issn	0167-9317	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/19602
dc.subject	Deposition	en
dc.subject	Fracture induced patterning	en
dc.subject	Gold nanoparticles	en
dc.subject.classification	Engineering, Electrical & Electronic	en
dc.subject.classification	Nanoscience & Nanotechnology	en
dc.subject.classification	Optics	en
dc.subject.classification	Physics, Applied	en
dc.subject.other	Aminopropyltrimethoxysilane	en
dc.subject.other	Functionalized	en
dc.subject.other	Gold colloids	en
dc.subject.other	Gold nanoparticles	en
dc.subject.other	Lift-off process	en
dc.subject.other	Line patterns	en
dc.subject.other	Low cost methods	en
dc.subject.other	Mask-less patterning	en
dc.subject.other	Patterned surfaces	en
dc.subject.other	Patterning techniques	en
dc.subject.other	Photoresist gratings	en
dc.subject.other	Photoresist layers	en
dc.subject.other	Selective depositions	en
dc.subject.other	Silicon dioxides	en
dc.subject.other	Surface functionalization	en
dc.subject.other	Colloid chemistry	en
dc.subject.other	Deposition	en
dc.subject.other	Fracture	en
dc.subject.other	Gold	en
dc.subject.other	Nanofluidics	en
dc.subject.other	Nanoparticles	en
dc.subject.other	Photoresistors	en
dc.subject.other	Silica	en
dc.subject.other	Silicon oxides	en
dc.subject.other	Surface treatment	en
dc.subject.other	Gold deposits	en
dc.title	Fabrication of gold nanoparticle lines based on fracture induced patterning	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/j.mee.2009.01.036	en
heal.identifier.secondary	http://dx.doi.org/10.1016/j.mee.2009.01.036	en
heal.language	English	en
heal.publicationDate	2009	en
heal.abstract	We present a low cost method for the selective deposition of gold nanoparticles from a gold colloid. We first introduce a process of maskless patterning on a photoresist layer. With this process, we have fabricated photoresist gratings with a period from 1 to 30 mu m, using the fracture induced patterning technique. Then we have performed gold nanoparticle deposition on this patterned surface by a surface functionalization technique. For that purpose, silicon dioxide (SiO2) was deposited on the sample followed by a lift-off process. The remained SiO2 lines after the lift-off were functionalized with 2,3-aminopropyltrimethoxysilane (APTMS) for the selective deposition of the gold colloid. After the deposition, the gold nanoparticles are well organized on top of the SiO2 line patterns. (C) 2009 Elsevier B.V. All rights reserved.	en
heal.publisher	ELSEVIER SCIENCE BV	en
heal.journalName	Microelectronic Engineering	en
dc.identifier.doi	10.1016/j.mee.2009.01.036	en
dc.identifier.isi	ISI:000267273300105	en
dc.identifier.volume	86	en
dc.identifier.issue	4-6	en
dc.identifier.spage	861	en
dc.identifier.epage	864	en