Fabrication of gold nanoparticle lines based on fracture induced patterning

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dc.contributor.author Tang, J en
dc.contributor.author Kolliopoulou, S en
dc.contributor.author Tsoukalas, D en
dc.date.accessioned 2014-03-01T01:30:31Z
dc.date.available 2014-03-01T01:30:31Z
dc.date.issued 2009 en
dc.identifier.issn 0167-9317 en
dc.identifier.uri http://hdl.handle.net/123456789/19602
dc.subject Deposition en
dc.subject Fracture induced patterning en
dc.subject Gold nanoparticles en
dc.subject.classification Engineering, Electrical & Electronic en
dc.subject.classification Nanoscience & Nanotechnology en
dc.subject.classification Optics en
dc.subject.classification Physics, Applied en
dc.subject.other Aminopropyltrimethoxysilane en
dc.subject.other Functionalized en
dc.subject.other Gold colloids en
dc.subject.other Gold nanoparticles en
dc.subject.other Lift-off process en
dc.subject.other Line patterns en
dc.subject.other Low cost methods en
dc.subject.other Mask-less patterning en
dc.subject.other Patterned surfaces en
dc.subject.other Patterning techniques en
dc.subject.other Photoresist gratings en
dc.subject.other Photoresist layers en
dc.subject.other Selective depositions en
dc.subject.other Silicon dioxides en
dc.subject.other Surface functionalization en
dc.subject.other Colloid chemistry en
dc.subject.other Deposition en
dc.subject.other Fracture en
dc.subject.other Gold en
dc.subject.other Nanofluidics en
dc.subject.other Nanoparticles en
dc.subject.other Photoresistors en
dc.subject.other Silica en
dc.subject.other Silicon oxides en
dc.subject.other Surface treatment en
dc.subject.other Gold deposits en
dc.title Fabrication of gold nanoparticle lines based on fracture induced patterning en
heal.type journalArticle en
heal.identifier.primary 10.1016/j.mee.2009.01.036 en
heal.identifier.secondary http://dx.doi.org/10.1016/j.mee.2009.01.036 en
heal.language English en
heal.publicationDate 2009 en
heal.abstract We present a low cost method for the selective deposition of gold nanoparticles from a gold colloid. We first introduce a process of maskless patterning on a photoresist layer. With this process, we have fabricated photoresist gratings with a period from 1 to 30 mu m, using the fracture induced patterning technique. Then we have performed gold nanoparticle deposition on this patterned surface by a surface functionalization technique. For that purpose, silicon dioxide (SiO2) was deposited on the sample followed by a lift-off process. The remained SiO2 lines after the lift-off were functionalized with 2,3-aminopropyltrimethoxysilane (APTMS) for the selective deposition of the gold colloid. After the deposition, the gold nanoparticles are well organized on top of the SiO2 line patterns. (C) 2009 Elsevier B.V. All rights reserved. en
heal.publisher ELSEVIER SCIENCE BV en
heal.journalName Microelectronic Engineering en
dc.identifier.doi 10.1016/j.mee.2009.01.036 en
dc.identifier.isi ISI:000267273300105 en
dc.identifier.volume 86 en
dc.identifier.issue 4-6 en
dc.identifier.spage 861 en
dc.identifier.epage 864 en

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