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Metallic nanoparticles for application in electronic non-volatile memories

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dc.contributor.author Tsoukalas, D en
dc.date.accessioned 2014-03-01T01:31:05Z
dc.date.available 2014-03-01T01:31:05Z
dc.date.issued 2009 en
dc.identifier.issn 1475-7435 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/19737
dc.subject Memories en
dc.subject MOS devices en
dc.subject Nanoparticles en
dc.subject Non-volatile en
dc.subject.classification Nanoscience & Nanotechnology en
dc.subject.classification Materials Science, Multidisciplinary en
dc.subject.other Metallic soaps en
dc.subject.other MOS devices en
dc.subject.other Nanoparticles en
dc.subject.other Surface plasmon resonance en
dc.subject.other Data retentions en
dc.subject.other Low voltages en
dc.subject.other Memories en
dc.subject.other Metallic nanoparticles en
dc.subject.other Non-volatile en
dc.subject.other Nonvolatile memories en
dc.subject.other Possible solutions en
dc.subject.other Processing approaches en
dc.subject.other Research groups en
dc.subject.other Retention characteristics en
dc.subject.other Semiconductor nano particles en
dc.subject.other University of durhams en
dc.subject.other Volatile memories en
dc.subject.other Data storage equipment en
dc.title Metallic nanoparticles for application in electronic non-volatile memories en
heal.type journalArticle en
heal.identifier.primary 10.1504/IJNT.2009.021706 en
heal.identifier.secondary http://dx.doi.org/10.1504/IJNT.2009.021706 en
heal.language English en
heal.publicationDate 2009 en
heal.abstract Nanoparticle memories have appeared during last years as a possible solution to overcome the scaling issue of electronic nonvolatile memories. Ultimately, we are looking for nanoparticle memories to significantly decrease the voltage needed to write/erase the memory without compromising its retention characteristics. As an alternative to semiconductor nanoparticles which have been intensively investigated, metallic nanoparticles have been recently also used since they have the potential for more versatile engineering of energy barriers. This would allow improved data retention for memory devices operating at low voltages. Processing approaches for metallic nanoparticle fabrication are addressed and corresponding memory devices performance is discussed. The work presented in this paper is a review of results obtained during the last four years within the Nanodevice Research group at NTUA in collaboration with IMEL/NCSR Demokritos and University of Durham. Copyright © 2009 Inderscience Enterprises Ltd. en
heal.publisher INDERSCIENCE ENTERPRISES LTD en
heal.journalName International Journal of Nanotechnology en
dc.identifier.doi 10.1504/IJNT.2009.021706 en
dc.identifier.isi ISI:000263037000004 en
dc.identifier.volume 6 en
dc.identifier.issue 1-2 en
dc.identifier.spage 35 en
dc.identifier.epage 45 en


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