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Photochemically-induced acid generation from 18-molybdodiphosphate and 18-tungstodiphosphate within poly(2-hydroxyethyl methacrylate) films

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dc.contributor.author Douvas, AM en
dc.contributor.author Kapella, A en
dc.contributor.author Dimotikali, D en
dc.contributor.author Argitis, P en
dc.date.accessioned 2014-03-01T01:31:39Z
dc.date.available 2014-03-01T01:31:39Z
dc.date.issued 2009 en
dc.identifier.issn 0020-1669 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/19867
dc.subject.classification Chemistry, Inorganic & Nuclear en
dc.subject.other ORGANIC-COMPOUNDS en
dc.subject.other RAMAN-SPECTRA en
dc.subject.other WELLS-DAWSON en
dc.subject.other POLYOXOMETALATE en
dc.subject.other TUNGSTEN en
dc.subject.other CHEMISTRY en
dc.subject.other DEVICES en
dc.subject.other LIGHT en
dc.subject.other SPECTROSCOPY en
dc.subject.other PHOTORESIST en
dc.title Photochemically-induced acid generation from 18-molybdodiphosphate and 18-tungstodiphosphate within poly(2-hydroxyethyl methacrylate) films en
heal.type journalArticle en
heal.identifier.primary 10.1021/ic900295n en
heal.identifier.secondary http://dx.doi.org/10.1021/ic900295n en
heal.language English en
heal.publicationDate 2009 en
heal.abstract The capability of ammonium 18-molybdodiphosphate, (NH4) 6P2Mo18O62 (Mo186-), and ammonium 18-tungstodipho-sphate, (NH4) 6P2W18O62 (W186-), to photochemically generate acid within films of a polymer with hydroxylic functional groups (namely, within poly(2-hydroxyethyl methacrylate) (PHEMA) films) is demonstrated. Upon UV irradiation, both 2:18 polyoxometalates (POMs) investigated are reduced with concomitant oxidation of PHEMA and generation of acid, which subsequently catalyzes the cross-linking of PHEMA. The photoacid generation is mainly evidenced by monitoring the protonation of an appropriate acid indicator (4-dimethylamino-4′-nitrostilbene) with UV spectroscopy and by photolithographic imaging experiments. By comparing the efficiency of both POMs to induce acid-catalyzed cross-linking of PHEMA under similar conditions, the W186- ion is found to be more efficient in photoacid generation than the Mo186- ion. Imaging of the POM-containing PHEMA films through UV photolithographic processing is demonstrated. In that process, both POMs can be entirely leached during the development step by using pure water as a developer, resulting in patterned PH EMA films. This characteristic renders the investigated POMs attractive materials for applications, especially in the area of biomaterials, where removal of the photoacid generator from the film at the end of the process is desirable. © 2009 American Chemical Society. en
heal.publisher AMER CHEMICAL SOC en
heal.journalName Inorganic Chemistry en
dc.identifier.doi 10.1021/ic900295n en
dc.identifier.isi ISI:000266428100051 en
dc.identifier.volume 48 en
dc.identifier.issue 11 en
dc.identifier.spage 4896 en
dc.identifier.epage 4907 en


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