Selective deposition of charged nanoparticles by self-electric focusing effect

Tang, J; Verrelli, E; Tsoukalas, D

dc.contributor.author	Tang, J	en
dc.contributor.author	Verrelli, E	en
dc.contributor.author	Tsoukalas, D	en
dc.date.accessioned	2014-03-01T01:31:51Z
dc.date.available	2014-03-01T01:31:51Z
dc.date.issued	2009	en
dc.identifier.issn	0167-9317	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/19958
dc.subject	Charged nanoparticles	en
dc.subject	Electric focusing	en
dc.subject	Sputtering	en
dc.subject.classification	Engineering, Electrical & Electronic	en
dc.subject.classification	Nanoscience & Nanotechnology	en
dc.subject.classification	Optics	en
dc.subject.classification	Physics, Applied	en
dc.subject.other	Charged nanoparticles	en
dc.subject.other	DC magnetron sputtering systems	en
dc.subject.other	Electric focusing	en
dc.subject.other	Focusing effects	en
dc.subject.other	Nickel nanoparticles	en
dc.subject.other	Orders of magnitudes	en
dc.subject.other	Patterned silicons	en
dc.subject.other	Selective depositions	en
dc.subject.other	Self-focusing effects	en
dc.subject.other	Silicon substrates	en
dc.subject.other	Width ratios	en
dc.subject.other	Electric fields	en
dc.subject.other	Focusing	en
dc.subject.other	Nonmetals	en
dc.subject.other	Photoresistors	en
dc.subject.other	Photoresists	en
dc.subject.other	Substrates	en
dc.subject.other	Surface treatment	en
dc.subject.other	Nanoparticles	en
dc.title	Selective deposition of charged nanoparticles by self-electric focusing effect	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/j.mee.2008.12.031	en
heal.identifier.secondary	http://dx.doi.org/10.1016/j.mee.2008.12.031	en
heal.language	English	en
heal.publicationDate	2009	en
heal.abstract	A process for the selective deposition of nanoparticles by a self-electric focusing effect is discussed. The negatively charged Nickel nanoparticles were fabricated by a DC magnetron sputtering system, and were deposited on a photoresist-patterned silicon substrate. Because of the different conductance between silicon and photoresist, the charges were accumulated on the photoresist as the nanoparticles were deposited, which caused a focusing electric field to drive the nanoparticles towards the silicon substrate. We have demonstrated that the self-focusing effect of the charged nanoparticles is responsible for increasing the density of nanoparticles in the lines patterned on silicon substrate by two orders of magnitude with respect to that on photoresist. The width of the silicon line and the width ratio between photoresist line and silicon line are the two most important parameters that will affect the self-focusing effect. (C) 2008 Elsevier B.V. All rights reserved.	en
heal.publisher	ELSEVIER SCIENCE BV	en
heal.journalName	Microelectronic Engineering	en
dc.identifier.doi	10.1016/j.mee.2008.12.031	en
dc.identifier.isi	ISI:000267273300116	en
dc.identifier.volume	86	en
dc.identifier.issue	4-6	en
dc.identifier.spage	898	en
dc.identifier.epage	901	en