Cyclodextrin inclusion complexes as novel MOCVD precursors for potential cobalt oxide deposition

Papadopoulos, ND; Karayianni, HS; Tsakiridis, PE; Perraki, M; Hristoforou, E

dc.contributor.author	Papadopoulos, ND	en
dc.contributor.author	Karayianni, HS	en
dc.contributor.author	Tsakiridis, PE	en
dc.contributor.author	Perraki, M	en
dc.contributor.author	Hristoforou, E	en
dc.date.accessioned	2014-03-01T01:33:06Z
dc.date.available	2014-03-01T01:33:06Z
dc.date.issued	2010	en
dc.identifier.issn	0268-2605	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/20320
dc.subject	Cobalt	en
dc.subject	CVD	en
dc.subject	Cyclodextrins	en
dc.subject	Inclusion complexes	en
dc.subject	Precursors	en
dc.subject.classification	Chemistry, Applied	en
dc.subject.classification	Chemistry, Inorganic & Nuclear	en
dc.subject.other	Bound water molecules	en
dc.subject.other	Cobalt oxides	en
dc.subject.other	Decomposition temperature	en
dc.subject.other	Inclusion complex	en
dc.subject.other	Iodine ions	en
dc.subject.other	Metal halide	en
dc.subject.other	Metal-organic	en
dc.subject.other	MOCVD	en
dc.subject.other	MOCVD precursors	en
dc.subject.other	Novel precursors	en
dc.subject.other	Sublimation temperature	en
dc.subject.other	Substrate temperature	en
dc.subject.other	Thermal decompositions	en
dc.subject.other	Thermal stability	en
dc.subject.other	Volatile by-products	en
dc.subject.other	Chemical modification	en
dc.subject.other	Chemical stability	en
dc.subject.other	Chemical vapor deposition	en
dc.subject.other	Cobalt	en
dc.subject.other	Cyclodextrins	en
dc.subject.other	Deposition	en
dc.subject.other	Heating	en
dc.subject.other	Iodine	en
dc.subject.other	Metal halides	en
dc.subject.other	Organometallics	en
dc.subject.other	Pyrolysis	en
dc.subject.other	Silanes	en
dc.subject.other	Sublimation	en
dc.subject.other	Cobalt compounds	en
dc.title	Cyclodextrin inclusion complexes as novel MOCVD precursors for potential cobalt oxide deposition	en
heal.type	journalArticle	en
heal.identifier.primary	10.1002/aoc.1588	en
heal.identifier.secondary	http://dx.doi.org/10.1002/aoc.1588	en
heal.language	English	en
heal.publicationDate	2010	en
heal.abstract	The potential use of the inclusion complexes of beta-cyclodextrins with metal halides as novel precursors in MOCVD applications was examined in terms of microstructure, thermal stability and chemical modifications during heating. The investigation was especially focused on the inclusion complex of beta-cyclodextrin with cobalt iodide for cobalt oxide thin film deposition. The general composition assigned to the dextrin's inclusion complex was: (beta-CD)(2)center dot Col(7)(center dot)11H(2)O. It was found that the inclusion complex of beta-cyclodextrin with Col(2) may prove a promising alternative to traditional metalorganic or organometallic Co-precursors for precise CVD applications. The sublimation temperature must be preferably in the range 70-125 degrees C, and the decomposition temperature (substrate temperature) in the range of 350-400 degrees C. Three distinct regions can be recognized by heating: transformation of tightly bound water molecules into easily movable ones, sublimation of iodine ions and Co atoms oscillation and thermal decomposition of the glycositic ring into volatile by-products. Copyright (C) 2009 John Wiley & Sons, Ltd.	en
heal.publisher	JOHN WILEY & SONS LTD	en
heal.journalName	Applied Organometallic Chemistry	en
dc.identifier.doi	10.1002/aoc.1588	en
dc.identifier.isi	ISI:000274162700007	en
dc.identifier.volume	24	en
dc.identifier.issue	2	en
dc.identifier.spage	112	en
dc.identifier.epage	121	en