Structural, electrical and mechanical properties of NiO thin films grown by pulsed laser deposition

Fasaki, I; Koutoulaki, A; Kompitsas, M; Charitidis, C

dc.contributor.author	Fasaki, I	en
dc.contributor.author	Koutoulaki, A	en
dc.contributor.author	Kompitsas, M	en
dc.contributor.author	Charitidis, C	en
dc.date.accessioned	2014-03-01T01:34:42Z
dc.date.available	2014-03-01T01:34:42Z
dc.date.issued	2010	en
dc.identifier.issn	0169-4332	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/20803
dc.subject	Electrical	en
dc.subject	Mechanical properties	en
dc.subject	Nickel oxide	en
dc.subject	PLD	en
dc.subject	Structural	en
dc.subject	Thin film deposition	en
dc.subject.classification	Chemistry, Physical	en
dc.subject.classification	Materials Science, Coatings & Films	en
dc.subject.classification	Physics, Applied	en
dc.subject.classification	Physics, Condensed Matter	en
dc.subject.other	Crystalline structure	en
dc.subject.other	Electrical	en
dc.subject.other	Electrical and mechanical properties	en
dc.subject.other	Electrical property	en
dc.subject.other	Grain size	en
dc.subject.other	Nanoindentation testing	en
dc.subject.other	Nanomechanical property	en
dc.subject.other	NiO films	en
dc.subject.other	NiO thin film	en
dc.subject.other	Oxygen pressure	en
dc.subject.other	PLD	en
dc.subject.other	Reactive pulsed laser deposition	en
dc.subject.other	Resistivity measurement	en
dc.subject.other	Si substrates	en
dc.subject.other	Structural	en
dc.subject.other	Substrate temperature	en
dc.subject.other	Thermally oxidized	en
dc.subject.other	Thin film deposition	en
dc.subject.other	Crystalline materials	en
dc.subject.other	Deposition	en
dc.subject.other	Electric properties	en
dc.subject.other	Hardness testing	en
dc.subject.other	Mechanical properties	en
dc.subject.other	Nanoindentation	en
dc.subject.other	Nickel	en
dc.subject.other	Nickel oxide	en
dc.subject.other	Oxide films	en
dc.subject.other	Oxygen	en
dc.subject.other	Pulsed laser deposition	en
dc.subject.other	Pulsed lasers	en
dc.subject.other	Substrates	en
dc.subject.other	Surface roughness	en
dc.subject.other	Surface testing	en
dc.subject.other	Thin films	en
dc.subject.other	Vapor deposition	en
dc.subject.other	Structural properties	en
dc.title	Structural, electrical and mechanical properties of NiO thin films grown by pulsed laser deposition	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/j.apsusc.2010.07.006	en
heal.identifier.secondary	http://dx.doi.org/10.1016/j.apsusc.2010.07.006	en
heal.language	English	en
heal.publicationDate	2010	en
heal.abstract	Nickel oxide (NiO) thin films were prepared by reactive pulsed laser deposition on thermally oxidized Si substrates in 10 Pa oxygen pressure. The substrate temperature during deposition was varied and its influence on the structural, electrical and nanomechanical properties was studied. It was proved that the structural properties were affected by the increase of substrate temperature improving the crystalline structure. Furthermore, a higher substrate temperature resulted in a thicker NiO film, which was attributed to an increased grain size. This effect influenced the electrical properties, too. Resistivity measurements showed that it increased with the increase of substrate temperature. For the first time, the nanomechanical properties of NiO films were studied. The formation and improvement of crystalline structure affected the nanomechanical properties. Nanoindentation testing of NiO thin films revealed an increase of hardness (H) and elastic modulus (E) and a decrease of surface roughness when increasing the substrate temperature. (C) 2010 Elsevier B.V. All rights reserved.	en
heal.publisher	ELSEVIER SCIENCE BV	en
heal.journalName	Applied Surface Science	en
dc.identifier.doi	10.1016/j.apsusc.2010.07.006	en
dc.identifier.isi	ISI:000281674200014	en
dc.identifier.volume	257	en
dc.identifier.issue	2	en
dc.identifier.spage	429	en
dc.identifier.epage	433	en