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Thermally activated conduction mechanisms in Silicon Nitride MIS structures

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dc.contributor.author Kanapitsas, A en
dc.contributor.author Tsonos, C en
dc.contributor.author Triantis, D en
dc.contributor.author Stavrakas, I en
dc.contributor.author Anastasiadis, C en
dc.contributor.author Photopoulos, P en
dc.contributor.author Pissis, P en
dc.contributor.author Em Vamvakas ,V en
dc.date.accessioned 2014-03-01T01:34:47Z
dc.date.available 2014-03-01T01:34:47Z
dc.date.issued 2010 en
dc.identifier.issn 0040-6090 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/20858
dc.subject Conduction mechanisms en
dc.subject DC conductivity en
dc.subject Silicon nitride en
dc.subject TSDC en
dc.subject.classification Materials Science, Multidisciplinary en
dc.subject.classification Materials Science, Coatings & Films en
dc.subject.classification Physics, Applied en
dc.subject.classification Physics, Condensed Matter en
dc.subject.other Ac Conductivity en
dc.subject.other Charge diffusion en
dc.subject.other Conduction Mechanism en
dc.subject.other Dc conductivity en
dc.subject.other High temperature en
dc.subject.other Low temperatures en
dc.subject.other MIS structure en
dc.subject.other Mobile carriers en
dc.subject.other Power law en
dc.subject.other Room temperature en
dc.subject.other Thermally activated en
dc.subject.other Thermally stimulated depolarisation currents en
dc.subject.other Switching circuits en
dc.subject.other Silicon nitride en
dc.title Thermally activated conduction mechanisms in Silicon Nitride MIS structures en
heal.type journalArticle en
heal.identifier.primary 10.1016/j.tsf.2009.10.112 en
heal.identifier.secondary http://dx.doi.org/10.1016/j.tsf.2009.10.112 en
heal.language English en
heal.publicationDate 2010 en
heal.abstract This publication reports on thermally activated currents in n-silicon/Si3N4/Al structures. The samples prepared were examined by means of I-V, C-V, ac conductivity and thermally stimulated depolarisation current (TSDC) measurements. The results indicate that DC conductivity is controlled by charge diffusion. Both conductivity and TSDC measurements indicate that mobile carriers which are trapped at the Si/nitride interface for low temperatures are de-trapped when temperature approaches room temperature resulting in a fast increase of DC conductivity. Additionally it is found that at high temperatures the ac conductivity follows a power law with respect to frequency where the exponent is close to two. Implications of this type of variation are also discussed. The results were used in order to explain the contribution of defects to the conduction mechanisms and the device behaviour. © 2009 Elsevier B.V. All rights reserved. en
heal.publisher ELSEVIER SCIENCE SA en
heal.journalName Thin Solid Films en
dc.identifier.doi 10.1016/j.tsf.2009.10.112 en
dc.identifier.isi ISI:000275615100015 en
dc.identifier.volume 518 en
dc.identifier.issue 9 en
dc.identifier.spage 2357 en
dc.identifier.epage 2360 en


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