dc.contributor.author |
Bazigos, A |
en |
dc.contributor.author |
Bucher, M |
en |
dc.contributor.author |
Assenmacher, J |
en |
dc.contributor.author |
Decker, S |
en |
dc.contributor.author |
Grabinski, W |
en |
dc.contributor.author |
Papananos, Y |
en |
dc.date.accessioned |
2014-03-01T01:35:04Z |
|
dc.date.available |
2014-03-01T01:35:04Z |
|
dc.date.issued |
2011 |
en |
dc.identifier.issn |
0018-9383 |
en |
dc.identifier.uri |
https://dspace.lib.ntua.gr/xmlui/handle/123456789/20965 |
|
dc.subject |
Charge-based model |
en |
dc.subject |
metal-oxide-semiconductor field-effect transistor (MOSFET) compact model |
en |
dc.subject |
moderate inversion |
en |
dc.subject |
parameter determination |
en |
dc.subject |
pocket implant |
en |
dc.subject |
threshold voltage |
en |
dc.subject.classification |
Engineering, Electrical & Electronic |
en |
dc.subject.classification |
Physics, Applied |
en |
dc.subject.other |
Charge-based model |
en |
dc.subject.other |
Compact model |
en |
dc.subject.other |
Moderate inversion |
en |
dc.subject.other |
Parameter determination |
en |
dc.subject.other |
pocket implant |
en |
dc.subject.other |
CMOS integrated circuits |
en |
dc.subject.other |
Dielectric devices |
en |
dc.subject.other |
Field effect semiconductor devices |
en |
dc.subject.other |
Lead oxide |
en |
dc.subject.other |
MOSFET devices |
en |
dc.subject.other |
Threshold voltage |
en |
dc.subject.other |
Transistor transistor logic circuits |
en |
dc.subject.other |
Transistors |
en |
dc.subject.other |
Vanadium |
en |
dc.subject.other |
Drain current |
en |
dc.title |
An adjusted constant-current method to determine saturated and linear mode threshold voltage of MOSFETs |
en |
heal.type |
journalArticle |
en |
heal.identifier.primary |
10.1109/TED.2011.2164080 |
en |
heal.identifier.secondary |
http://dx.doi.org/10.1109/TED.2011.2164080 |
en |
heal.identifier.secondary |
6003772 |
en |
heal.language |
English |
en |
heal.publicationDate |
2011 |
en |
heal.abstract |
The constant-current (CC) method uses a current criterion to determine the threshold voltage (VTH) of metal-oxide-semiconductor (MOS) field-effect transistors. We show that using the same current criterion in both saturation and linear modes leads to inconsistent results and incorrect interpretation of effects, such as drain-induced barrier lowering in advanced CMOS halo-implanted devices. The generalized adjusted CC method is based on the theory of the charge-based MOS transistor model. It introduces an adjusted current criterion, depending on VDS, allowing to coherently determine VTH for the entire range of VDS from linear operation to saturation. The method uses commonly available ID versus VG data with focus on moderate inversion. The method is validated with respect to the ideal surface potential model, and its suitability is demonstrated with technology-computer-aided-design data from a 65-nm CMOS technology and measured data from a 90-nm CMOS technology. Comparison with other widely used threshold voltage extraction methods is provided. © 2011 IEEE. |
en |
heal.publisher |
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC |
en |
heal.journalName |
IEEE Transactions on Electron Devices |
en |
dc.identifier.doi |
10.1109/TED.2011.2164080 |
en |
dc.identifier.isi |
ISI:000296099400013 |
en |
dc.identifier.volume |
58 |
en |
dc.identifier.issue |
11 |
en |
dc.identifier.spage |
3751 |
en |
dc.identifier.epage |
3758 |
en |