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Effects of MOCVD thin cobalt films' structure and surface characteristics on their magnetic behavior

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dc.contributor.author Papadopoulos, N en
dc.contributor.author Karayianni, C-S en
dc.contributor.author Tsakiridis, P en
dc.contributor.author Sarantopoulou, E en
dc.contributor.author Hristoforou, E en
dc.date.accessioned 2014-03-01T01:35:36Z
dc.date.available 2014-03-01T01:35:36Z
dc.date.issued 2011 en
dc.identifier.issn 0948-1907 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/21119
dc.subject Aerosol Delivery en
dc.subject Cobalt en
dc.subject Magnetization en
dc.subject MOCVD en
dc.subject Precursors en
dc.subject Thin Films en
dc.subject.classification Electrochemistry en
dc.subject.classification Materials Science, Coatings & Films en
dc.subject.classification Physics, Condensed Matter en
dc.subject.other Aerosol delivery en
dc.subject.other Applied magnetic fields en
dc.subject.other Co films en
dc.subject.other Cobalt acetylacetonate en
dc.subject.other Cobalt carbonyl en
dc.subject.other Cobalt thin films en
dc.subject.other Delivery methods en
dc.subject.other Experimental conditions en
dc.subject.other Magnetic behavior en
dc.subject.other Metal-organic en
dc.subject.other Planarity en
dc.subject.other Precursors en
dc.subject.other Surface characteristics en
dc.subject.other Thin cobalt films en
dc.subject.other Atmospheric aerosols en
dc.subject.other Carbon dioxide en
dc.subject.other Dichloromethane en
dc.subject.other Electric resistance en
dc.subject.other Giant magnetoresistance en
dc.subject.other Magnetic fields en
dc.subject.other Magnetic properties en
dc.subject.other Magnetic recording en
dc.subject.other Magnetization en
dc.subject.other Metallorganic chemical vapor deposition en
dc.subject.other Silicon compounds en
dc.subject.other Surface morphology en
dc.subject.other Thin films en
dc.subject.other Cobalt en
dc.title Effects of MOCVD thin cobalt films' structure and surface characteristics on their magnetic behavior en
heal.type journalArticle en
heal.identifier.primary 10.1002/cvde.201106907 en
heal.identifier.secondary http://dx.doi.org/10.1002/cvde.201106907 en
heal.language English en
heal.publicationDate 2011 en
heal.abstract Cobalt thin films are deposited by metal-organic (MO)CVD, under various experimental conditions, on Si and SiO2 substrates. The precursors used are cobalt nitrosyl tricarbonyl, Co(CO)3NO, cobalt acetylacetonate, Co(acac)2, and cobalt carbonyl, Co2(CO)8. Emphasis is given to the delivery method of each precursor, especially to a new technique of aerosol delivery. The films are thoroughly examined in terms of microstructure and surface morphology in order to establish relevance to magnetic properties. It is found that Co films deposited from Co2(CO)8 dissolved in dichloromethane are characterized by a high degree of planarity and purity, while exhibiting a non-hysteretic giant magnetoresistance (GMR) behavior in the presence of an externally applied magnetic field normal to their surface. Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. en
heal.publisher WILEY-BLACKWELL en
heal.journalName Chemical Vapor Deposition en
dc.identifier.doi 10.1002/cvde.201106907 en
dc.identifier.isi ISI:000295230400007 en
dc.identifier.volume 17 en
dc.identifier.issue 7-9 en
dc.identifier.spage 211 en
dc.identifier.epage 220 en


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