Effects of MOCVD thin cobalt films' structure and surface characteristics on their magnetic behavior

Papadopoulos, N; Karayianni, C-S; Tsakiridis, P; Sarantopoulou, E; Hristoforou, E

dc.contributor.author	Papadopoulos, N	en
dc.contributor.author	Karayianni, C-S	en
dc.contributor.author	Tsakiridis, P	en
dc.contributor.author	Sarantopoulou, E	en
dc.contributor.author	Hristoforou, E	en
dc.date.accessioned	2014-03-01T01:35:36Z
dc.date.available	2014-03-01T01:35:36Z
dc.date.issued	2011	en
dc.identifier.issn	0948-1907	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/21119
dc.subject	Aerosol Delivery	en
dc.subject	Cobalt	en
dc.subject	Magnetization	en
dc.subject	MOCVD	en
dc.subject	Precursors	en
dc.subject	Thin Films	en
dc.subject.classification	Electrochemistry	en
dc.subject.classification	Materials Science, Coatings & Films	en
dc.subject.classification	Physics, Condensed Matter	en
dc.subject.other	Aerosol delivery	en
dc.subject.other	Applied magnetic fields	en
dc.subject.other	Co films	en
dc.subject.other	Cobalt acetylacetonate	en
dc.subject.other	Cobalt carbonyl	en
dc.subject.other	Cobalt thin films	en
dc.subject.other	Delivery methods	en
dc.subject.other	Experimental conditions	en
dc.subject.other	Magnetic behavior	en
dc.subject.other	Metal-organic	en
dc.subject.other	Planarity	en
dc.subject.other	Precursors	en
dc.subject.other	Surface characteristics	en
dc.subject.other	Thin cobalt films	en
dc.subject.other	Atmospheric aerosols	en
dc.subject.other	Carbon dioxide	en
dc.subject.other	Dichloromethane	en
dc.subject.other	Electric resistance	en
dc.subject.other	Giant magnetoresistance	en
dc.subject.other	Magnetic fields	en
dc.subject.other	Magnetic properties	en
dc.subject.other	Magnetic recording	en
dc.subject.other	Magnetization	en
dc.subject.other	Metallorganic chemical vapor deposition	en
dc.subject.other	Silicon compounds	en
dc.subject.other	Surface morphology	en
dc.subject.other	Thin films	en
dc.subject.other	Cobalt	en
dc.title	Effects of MOCVD thin cobalt films' structure and surface characteristics on their magnetic behavior	en
heal.type	journalArticle	en
heal.identifier.primary	10.1002/cvde.201106907	en
heal.identifier.secondary	http://dx.doi.org/10.1002/cvde.201106907	en
heal.language	English	en
heal.publicationDate	2011	en
heal.abstract	Cobalt thin films are deposited by metal-organic (MO)CVD, under various experimental conditions, on Si and SiO2 substrates. The precursors used are cobalt nitrosyl tricarbonyl, Co(CO)3NO, cobalt acetylacetonate, Co(acac)2, and cobalt carbonyl, Co2(CO)8. Emphasis is given to the delivery method of each precursor, especially to a new technique of aerosol delivery. The films are thoroughly examined in terms of microstructure and surface morphology in order to establish relevance to magnetic properties. It is found that Co films deposited from Co2(CO)8 dissolved in dichloromethane are characterized by a high degree of planarity and purity, while exhibiting a non-hysteretic giant magnetoresistance (GMR) behavior in the presence of an externally applied magnetic field normal to their surface. Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.	en
heal.publisher	WILEY-BLACKWELL	en
heal.journalName	Chemical Vapor Deposition	en
dc.identifier.doi	10.1002/cvde.201106907	en
dc.identifier.isi	ISI:000295230400007	en
dc.identifier.volume	17	en
dc.identifier.issue	7-9	en
dc.identifier.spage	211	en
dc.identifier.epage	220	en