Enabling a commercial computational fluid dynamics code to perform certain nonlinear analysis tasks

Cheimarios, N; Koronaki, ED; Boudouvis, AG

dc.contributor.author	Cheimarios, N	en
dc.contributor.author	Koronaki, ED	en
dc.contributor.author	Boudouvis, AG	en
dc.date.accessioned	2014-03-01T01:35:38Z
dc.date.available	2014-03-01T01:35:38Z
dc.date.issued	2011	en
dc.identifier.issn	0098-1354	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/21132
dc.subject	Chemical vapor deposition	en
dc.subject	Computational fluid dynamics	en
dc.subject	Recursive Projection Method	en
dc.subject	Solution tracing	en
dc.subject	Unstable solutions	en
dc.subject.classification	Computer Science, Interdisciplinary Applications	en
dc.subject.classification	Engineering, Chemical	en
dc.subject.other	Carrier gas	en
dc.subject.other	Chemical model	en
dc.subject.other	Chemical vapor deposition reactors	en
dc.subject.other	Complete solutions	en
dc.subject.other	Computational Fluid Dynamics codes	en
dc.subject.other	Mass fraction distribution	en
dc.subject.other	Mixed convection flow	en
dc.subject.other	Multiple steady state	en
dc.subject.other	Physical mechanism	en
dc.subject.other	Projection method	en
dc.subject.other	Silylenes	en
dc.subject.other	Solutal convections	en
dc.subject.other	Stagnation points	en
dc.subject.other	Turning points	en
dc.subject.other	Unstable solutions	en
dc.subject.other	Computational fluid dynamics	en
dc.subject.other	Dynamics	en
dc.subject.other	Film growth	en
dc.subject.other	Fluids	en
dc.subject.other	Hydrogen	en
dc.subject.other	Natural convection	en
dc.subject.other	Nitrogen	en
dc.subject.other	Nonlinear analysis	en
dc.subject.other	Reynolds number	en
dc.subject.other	Trace analysis	en
dc.subject.other	Chemical vapor deposition	en
dc.title	Enabling a commercial computational fluid dynamics code to perform certain nonlinear analysis tasks	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/j.compchemeng.2011.03.008	en
heal.identifier.secondary	http://dx.doi.org/10.1016/j.compchemeng.2011.03.008	en
heal.language	English	en
heal.publicationDate	2011	en
heal.abstract	In this work we enable the commercial computational fluid dynamics code Fluent, to successfully trace a complete solution branch, even past turning points. Here the so-called Recursive Projection Method (RPM) is implemented as a computational shell "wrapped" around Fluent, in conjunction with a pseudo-arc-length method for convergence on the unstable branch. The case study is a mixed convection flow in a stagnation point chemical vapor deposition (CVD) reactor. Multiple steady states coexist over a range of inlet Reynolds numbers, due to the competition of the two dominant physical mechanisms: forced and free convection. Continuation on the solution branch reveals a curve consisting of a stable branch, dominated by free convection, followed, past the first turning point, by an unstable branch. Past a second turning point, follows another stable branch dominated by forced convection. Taking the problem a step further, it is augmented with a chemical model describing the deposition of silicon (Si) from silane (SiH4), silylene (SiH2) and hydrogen (H-2). The solution branch does not alter since the gas mixture is dilute and the carrier gas, in this case nitrogen (N-2), and the precursor, in this case SiH4, are of similar molar masses; the concentration differences cannot lead to solutal convection. Results for the mass fraction distribution inside the reactor and the film growth rates are reported in all parts of the solution branch. (C) 2011 Elsevier Ltd. All rights reserved.	en
heal.publisher	PERGAMON-ELSEVIER SCIENCE LTD	en
heal.journalName	Computers and Chemical Engineering	en
dc.identifier.doi	10.1016/j.compchemeng.2011.03.008	en
dc.identifier.isi	ISI:000296871800005	en
dc.identifier.volume	35	en
dc.identifier.issue	12	en
dc.identifier.spage	2632	en
dc.identifier.epage	2645	en