Two-dimensional nanoparticle self-assembly using plasma-induced Ostwald ripening

Tang, J; Photopoulos, P; Tserepi, A; Tsoukalas, D

dc.contributor.author	Tang, J	en
dc.contributor.author	Photopoulos, P	en
dc.contributor.author	Tserepi, A	en
dc.contributor.author	Tsoukalas, D	en
dc.date.accessioned	2014-03-01T01:37:30Z
dc.date.available	2014-03-01T01:37:30Z
dc.date.issued	2011	en
dc.identifier.issn	0957-4484	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/21529
dc.subject.classification	Engineering, Multidisciplinary	en
dc.subject.classification	Nanoscience & Nanotechnology	en
dc.subject.classification	Materials Science, Multidisciplinary	en
dc.subject.classification	Physics, Applied	en
dc.subject.other	Ag nanoparticle	en
dc.subject.other	Ar plasma treatment	en
dc.subject.other	Dc magnetron sputtering	en
dc.subject.other	Different sizes	en
dc.subject.other	Nanoparticle density	en
dc.subject.other	Nanoparticle self-assembly	en
dc.subject.other	Particle densities	en
dc.subject.other	Plasma treatment	en
dc.subject.other	Plasma-induced	en
dc.subject.other	Potential applications	en
dc.subject.other	Rapid method	en
dc.subject.other	Ripening process	en
dc.subject.other	Si substrates	en
dc.subject.other	Biosensors	en
dc.subject.other	Nanoparticles	en
dc.subject.other	Ostwald ripening	en
dc.subject.other	Phosphorus	en
dc.subject.other	Plasma applications	en
dc.subject.other	Plasmas	en
dc.subject.other	Self assembly	en
dc.subject.other	Two dimensional	en
dc.subject.other	Silver	en
dc.title	Two-dimensional nanoparticle self-assembly using plasma-induced Ostwald ripening	en
heal.type	journalArticle	en
heal.identifier.primary	10.1088/0957-4484/22/23/235306	en
heal.identifier.secondary	http://dx.doi.org/10.1088/0957-4484/22/23/235306	en
heal.identifier.secondary	235306	en
heal.language	English	en
heal.publicationDate	2011	en
heal.abstract	In this work, a novel Ag nanoparticle self-assembly process based on plasma-induced two-dimensional Ostwald ripening is demonstrated. Ag nanoparticles are deposited on p-doped Si substrates using a DC magnetron sputtering process. With the assistance of O2/Ar plasma treatment, different sizes and patterns of Ag nanoparticles are formed, due to the Ostwald ripening. The evolution of plasma-induced nanoparticle ripening is studied and a clear increase in particle size and a decrease in particle density are observed with increasing plasma treatment. From the experiments, it is concluded that the initial nanoparticle density and the plasma gas mixture (Ar/O2 ratio) are important factors that affect the ripening process. The proposed plasma-directed Ag nanoparticle self-assembly provides a rapid method of tailoring the nanoparticle distribution on substrates, with potential applications in the fields of solar cells, biosensors, and catalysis. © 2011 IOP Publishing Ltd.	en
heal.publisher	IOP PUBLISHING LTD	en
heal.journalName	Nanotechnology	en
dc.identifier.doi	10.1088/0957-4484/22/23/235306	en
dc.identifier.isi	ISI:000289517400009	en
dc.identifier.volume	22	en
dc.identifier.issue	23	en