Two-dimensional nanoparticle self-assembly using plasma-induced Ostwald ripening

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dc.contributor.author Tang, J en
dc.contributor.author Photopoulos, P en
dc.contributor.author Tserepi, A en
dc.contributor.author Tsoukalas, D en
dc.date.accessioned 2014-03-01T01:37:30Z
dc.date.available 2014-03-01T01:37:30Z
dc.date.issued 2011 en
dc.identifier.issn 0957-4484 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/21529
dc.subject.classification Engineering, Multidisciplinary en
dc.subject.classification Nanoscience & Nanotechnology en
dc.subject.classification Materials Science, Multidisciplinary en
dc.subject.classification Physics, Applied en
dc.subject.other Ag nanoparticle en
dc.subject.other Ar plasma treatment en
dc.subject.other Dc magnetron sputtering en
dc.subject.other Different sizes en
dc.subject.other Nanoparticle density en
dc.subject.other Nanoparticle self-assembly en
dc.subject.other Particle densities en
dc.subject.other Plasma treatment en
dc.subject.other Plasma-induced en
dc.subject.other Potential applications en
dc.subject.other Rapid method en
dc.subject.other Ripening process en
dc.subject.other Si substrates en
dc.subject.other Biosensors en
dc.subject.other Nanoparticles en
dc.subject.other Ostwald ripening en
dc.subject.other Phosphorus en
dc.subject.other Plasma applications en
dc.subject.other Plasmas en
dc.subject.other Self assembly en
dc.subject.other Two dimensional en
dc.subject.other Silver en
dc.title Two-dimensional nanoparticle self-assembly using plasma-induced Ostwald ripening en
heal.type journalArticle en
heal.identifier.primary 10.1088/0957-4484/22/23/235306 en
heal.identifier.secondary http://dx.doi.org/10.1088/0957-4484/22/23/235306 en
heal.identifier.secondary 235306 en
heal.language English en
heal.publicationDate 2011 en
heal.abstract In this work, a novel Ag nanoparticle self-assembly process based on plasma-induced two-dimensional Ostwald ripening is demonstrated. Ag nanoparticles are deposited on p-doped Si substrates using a DC magnetron sputtering process. With the assistance of O2/Ar plasma treatment, different sizes and patterns of Ag nanoparticles are formed, due to the Ostwald ripening. The evolution of plasma-induced nanoparticle ripening is studied and a clear increase in particle size and a decrease in particle density are observed with increasing plasma treatment. From the experiments, it is concluded that the initial nanoparticle density and the plasma gas mixture (Ar/O2 ratio) are important factors that affect the ripening process. The proposed plasma-directed Ag nanoparticle self-assembly provides a rapid method of tailoring the nanoparticle distribution on substrates, with potential applications in the fields of solar cells, biosensors, and catalysis. © 2011 IOP Publishing Ltd. en
heal.publisher IOP PUBLISHING LTD en
heal.journalName Nanotechnology en
dc.identifier.doi 10.1088/0957-4484/22/23/235306 en
dc.identifier.isi ISI:000289517400009 en
dc.identifier.volume 22 en
dc.identifier.issue 23 en

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