dc.contributor.author |
Tsoutsouva, MG |
en |
dc.contributor.author |
Panagopoulos, CN |
en |
dc.contributor.author |
Papadimitriou, D |
en |
dc.contributor.author |
Fasaki, I |
en |
dc.contributor.author |
Kompitsas, M |
en |
dc.date.accessioned |
2014-03-01T01:37:34Z |
|
dc.date.available |
2014-03-01T01:37:34Z |
|
dc.date.issued |
2011 |
en |
dc.identifier.issn |
0921-5107 |
en |
dc.identifier.uri |
https://dspace.lib.ntua.gr/xmlui/handle/123456789/21557 |
|
dc.subject |
Electrical properties |
en |
dc.subject |
Optical |
en |
dc.subject |
Pulsed laser deposition |
en |
dc.subject |
Structural |
en |
dc.subject |
Zinc oxide thin films |
en |
dc.subject.classification |
Materials Science, Multidisciplinary |
en |
dc.subject.classification |
Physics, Condensed Matter |
en |
dc.subject.other |
Electrical measurement |
en |
dc.subject.other |
Electrical property |
en |
dc.subject.other |
Energy bandgaps |
en |
dc.subject.other |
Film resistivity |
en |
dc.subject.other |
Hexagonal wurtzite structure |
en |
dc.subject.other |
High quality |
en |
dc.subject.other |
High transmittance |
en |
dc.subject.other |
Optical |
en |
dc.subject.other |
Oxygen pressure |
en |
dc.subject.other |
Polycrystalline ZnO |
en |
dc.subject.other |
Reactive atmospheres |
en |
dc.subject.other |
RMS roughness |
en |
dc.subject.other |
Soda lime glass substrate |
en |
dc.subject.other |
Structural |
en |
dc.subject.other |
Substrate temperature |
en |
dc.subject.other |
Zinc oxide thin films |
en |
dc.subject.other |
ZnO |
en |
dc.subject.other |
ZnO films |
en |
dc.subject.other |
ZnO thin film |
en |
dc.subject.other |
Deposition |
en |
dc.subject.other |
Electric properties |
en |
dc.subject.other |
Film preparation |
en |
dc.subject.other |
Glass lasers |
en |
dc.subject.other |
Metallic films |
en |
dc.subject.other |
Optical properties |
en |
dc.subject.other |
Oxygen |
en |
dc.subject.other |
Pulsed laser deposition |
en |
dc.subject.other |
Pulsed lasers |
en |
dc.subject.other |
Substrates |
en |
dc.subject.other |
Thin films |
en |
dc.subject.other |
Vapor deposition |
en |
dc.subject.other |
Zinc |
en |
dc.subject.other |
Zinc oxide |
en |
dc.subject.other |
Zinc sulfide |
en |
dc.subject.other |
Oxide films |
en |
dc.title |
ZnO thin films prepared by pulsed laser deposition |
en |
heal.type |
journalArticle |
en |
heal.identifier.primary |
10.1016/j.mseb.2010.03.059 |
en |
heal.identifier.secondary |
http://dx.doi.org/10.1016/j.mseb.2010.03.059 |
en |
heal.language |
English |
en |
heal.publicationDate |
2011 |
en |
heal.abstract |
Zinc oxide (ZnO) thin films were deposited on soda lime glass substrates by pulsed laser deposition (PLD) in an oxygen-reactive atmosphere. The structural, optical, and electrical properties of the as-prepared thin films were studied in dependence of substrate temperature and oxygen pressure. High quality poly-crystalline ZnO films with hexagonal wurtzite structure were deposited at substrate temperatures of 100 and 300 degrees C. The RMS roughness of the deposited oxide films was found to be in the range 2-9 nm and was only slightly dependent on substrate temperature and oxygen pressure. Electrical measurements indicated a decrease of film resistivity with the increase of substrate temperature and the decrease of oxygen pressure. The ZnO films exhibited high transmittance of 90% and their energy band gap and thickness were in the range 3.26-3.30 eV and 256-627 nm, respectively. (C) 2010 Elsevier B.V. All rights reserved. |
en |
heal.publisher |
ELSEVIER SCIENCE BV |
en |
heal.journalName |
Materials Science and Engineering B: Solid-State Materials for Advanced Technology |
en |
dc.identifier.doi |
10.1016/j.mseb.2010.03.059 |
en |
dc.identifier.isi |
ISI:000289920600005 |
en |
dc.identifier.volume |
176 |
en |
dc.identifier.issue |
6 |
en |
dc.identifier.spage |
480 |
en |
dc.identifier.epage |
483 |
en |