Laser-induced thermal strains in isotropic media: Polycrystalline Si

Liarokapis, E; Anastassakis, E

dc.contributor.author	Liarokapis, E	en
dc.contributor.author	Anastassakis, E	en
dc.date.accessioned	2014-03-01T01:39:25Z
dc.date.available	2014-03-01T01:39:25Z
dc.date.issued	1988	en
dc.identifier.issn	00218979	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/22774
dc.title	Laser-induced thermal strains in isotropic media: Polycrystalline Si	en
heal.type	journalArticle	en
heal.identifier.primary	10.1063/1.340999	en
heal.identifier.secondary	http://dx.doi.org/10.1063/1.340999	en
heal.publicationDate	1988	en
heal.abstract	Analytic solutions for the spatial distribution of elastic deformations, strains, and stresses induced on the surface and interior of an isotropic semi-infinite material by an arbitrary temperature distribution are applied to an isotropic medium which is exposed to an intense cw laser beam. We demonstrate results of such calculations in the case of polycrystalline silicon. The method can be applied to any polycrystalline material, or even moderately anisotropic cubic crystals. The calculations show the presence of considerable amounts of thermal strains or stresses for laser power densities below melting.	en
heal.journalName	Journal of Applied Physics	en
dc.identifier.doi	10.1063/1.340999	en
dc.identifier.volume	63	en
dc.identifier.issue	8	en
dc.identifier.spage	2615	en
dc.identifier.epage	2619	en