Effect of processing parameters on the properties of hydroxylapatite films grown by pulsed laser deposition

Jelínek, M; Jastrabík, L; Hnatowicz, V; Kvítek, J; Havránek, V; Dostálová, T; Zergioti, I; Petrakis, A; Hontzopoulos, E; Fotakis, C

dc.contributor.author	Jelínek, M	en
dc.contributor.author	Jastrabík, L	en
dc.contributor.author	Hnatowicz, V	en
dc.contributor.author	Kvítek, J	en
dc.contributor.author	Havránek, V	en
dc.contributor.author	Dostálová, T	en
dc.contributor.author	Zergioti, I	en
dc.contributor.author	Petrakis, A	en
dc.contributor.author	Hontzopoulos, E	en
dc.contributor.author	Fotakis, C	en
dc.date.accessioned	2014-03-01T01:43:07Z
dc.date.available	2014-03-01T01:43:07Z
dc.date.issued	1995	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/24049
dc.subject	Energy Density	en
dc.subject	Growth Mechanism	en
dc.subject	Laser Ablation	en
dc.subject	P Ratio	en
dc.subject	Process Parameters	en
dc.subject	Pulsed Laser Deposition	en
dc.subject	Scanning Electron Microscopy	en
dc.subject	Surface Morphology	en
dc.subject	Thin Film	en
dc.subject	X Ray Diffraction	en
dc.subject	Particle Induced X Ray Emission	en
dc.subject	Physical Vapour Deposition	en
dc.subject	Time of Flight	en
dc.title	Effect of processing parameters on the properties of hydroxylapatite films grown by pulsed laser deposition	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/0040-6090(94)06340-0	en
heal.identifier.secondary	http://dx.doi.org/10.1016/0040-6090(94)06340-0	en
heal.publicationDate	1995	en
heal.abstract	Thin films of hydroxylapatite (HA) (Ca10(PO4)6(OH)2) were created on Ti substrates by KrF laser ablation. The layers were deposited in vacuum, in pure H2O vapours (pressure, 2 × 10−3 to 2 × 10−1 mbar) and in an Ar-H2O vapour mixture. The influence of the laser energy density ET (3 J cm−2, 13 J cm−2) and substrate temperature Ts (500–760 °C)	en
heal.journalName	Thin Solid Films	en
dc.identifier.doi	10.1016/0040-6090(94)06340-0	en