Growth of TiB 2 and TiC coatings using pulsed laser deposition

Zergioti, I; Fotakis, C; Haidemenopoulos, G

dc.contributor.author	Zergioti, I	en
dc.contributor.author	Fotakis, C	en
dc.contributor.author	Haidemenopoulos, G	en
dc.date.accessioned	2014-03-01T01:45:36Z
dc.date.available	2014-03-01T01:45:36Z
dc.date.issued	1997	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/24647
dc.subject	Electrical Resistance	en
dc.subject	Excimer Laser	en
dc.subject	Grain Size	en
dc.subject	Pulsed Laser Deposition	en
dc.subject	Residual Stress	en
dc.subject	Scanning Electron Microscopy	en
dc.subject	Structural Properties	en
dc.subject	Transmission Electron Microscopy	en
dc.subject	X Ray Diffraction	en
dc.subject	X Ray Diffractometry	en
dc.title	Growth of TiB 2 and TiC coatings using pulsed laser deposition	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0040-6090(97)00128-4	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0040-6090(97)00128-4	en
heal.publicationDate	1997	en
heal.abstract	Refractory coatings of TiC and TiB2 have been grown by pulsed laser deposition on Si(100) and on X155 steel at various substrate temperatures ranging from 40°C–650°C. A pulsed KrF excimer laser was used with the deposition chamber at a base pressure of 10−6 mbar. The morphology and structure of the films, studied with scanning electron microscopy (SEM), X-ray diffractometry (XRD)	en
heal.journalName	Thin Solid Films	en
dc.identifier.doi	10.1016/S0040-6090(97)00128-4	en