On the nanocrystalline structure of TiC and TiB 2 produced by laser ablation

Zergioti, I; Haidemenopoulos, G

dc.contributor.author	Zergioti, I	en
dc.contributor.author	Haidemenopoulos, G	en
dc.date.accessioned	2014-03-01T01:45:43Z
dc.date.available	2014-03-01T01:45:43Z
dc.date.issued	1997	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/24694
dc.subject	Grain Size	en
dc.subject	Laser Ablation	en
dc.subject	Pulsed Laser Deposition	en
dc.subject	Thin Film	en
dc.subject	Transmission Electron Microscopy	en
dc.title	On the nanocrystalline structure of TiC and TiB 2 produced by laser ablation	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0965-9773(97)81417-1	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0965-9773(97)81417-1	en
heal.publicationDate	1997	en
heal.abstract	Thin films of TiC and TiB2 have been deposited on silicon substrate by pulsed laser deposition technique, under substrate temperatures 25–600 °C. Transmission electron microscopy revealed the nanocrystalline structure of the coatings. The grain size for the TiC film was between 10 and 70 nm and for the TiB2 film was between 10 and 50 nm.	en
heal.journalName	Nanostructured Materials	en
dc.identifier.doi	10.1016/S0965-9773(97)81417-1	en