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Magnetoelastic characterization of thin films dedicated to magnetomechanical microsensor applications

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dc.contributor.author Chiriac, H en
dc.contributor.author Pletea, M en
dc.contributor.author Hristoforou, E en
dc.date.accessioned 2014-03-01T01:46:45Z
dc.date.available 2014-03-01T01:46:45Z
dc.date.issued 1998 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/25039
dc.subject Amorphous Thin Films en
dc.subject Curie Temperature en
dc.subject Magnetic Properties en
dc.subject Thin Film en
dc.title Magnetoelastic characterization of thin films dedicated to magnetomechanical microsensor applications en
heal.type journalArticle en
heal.identifier.primary 10.1016/S0924-4247(98)00033-8 en
heal.identifier.secondary http://dx.doi.org/10.1016/S0924-4247(98)00033-8 en
heal.publicationDate 1998 en
heal.abstract This paper discusses the results of measurements on the saturation magnetostriction constant λs, magnetoelastic coupling coefficient bγ,2 and magnetostriction strain coefficient d for Ni-evaporated and Fe70B20Si6C4-sputtered thin films on silicon and mica substrates. These results are presented in correlation with other magnetic properties (i.e., saturation magnetization, Curie temperature and anisotropy field) which characterize magnetoelastic sensing applications. We have demonstrated that en
heal.journalName Sensors and Actuators A-physical en
dc.identifier.doi 10.1016/S0924-4247(98)00033-8 en


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