Magnetoelastic characterization of thin films dedicated to magnetomechanical microsensor applications

Chiriac, H; Pletea, M; Hristoforou, E

dc.contributor.author	Chiriac, H	en
dc.contributor.author	Pletea, M	en
dc.contributor.author	Hristoforou, E	en
dc.date.accessioned	2014-03-01T01:46:45Z
dc.date.available	2014-03-01T01:46:45Z
dc.date.issued	1998	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/25039
dc.subject	Amorphous Thin Films	en
dc.subject	Curie Temperature	en
dc.subject	Magnetic Properties	en
dc.subject	Thin Film	en
dc.title	Magnetoelastic characterization of thin films dedicated to magnetomechanical microsensor applications	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0924-4247(98)00033-8	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0924-4247(98)00033-8	en
heal.publicationDate	1998	en
heal.abstract	This paper discusses the results of measurements on the saturation magnetostriction constant λs, magnetoelastic coupling coefficient bγ,2 and magnetostriction strain coefficient d for Ni-evaporated and Fe70B20Si6C4-sputtered thin films on silicon and mica substrates. These results are presented in correlation with other magnetic properties (i.e., saturation magnetization, Curie temperature and anisotropy field) which characterize magnetoelastic sensing applications. We have demonstrated that	en
heal.journalName	Sensors and Actuators A-physical	en
dc.identifier.doi	10.1016/S0924-4247(98)00033-8	en