Microdeposition of metals by femtosecond excimer laser

Zergioti, I; Mailis, S; Vainos, N; Fotakis, C; Chen, S; Grigoropoulos, C

dc.contributor.author	Zergioti, I	en
dc.contributor.author	Mailis, S	en
dc.contributor.author	Vainos, N	en
dc.contributor.author	Fotakis, C	en
dc.contributor.author	Chen, S	en
dc.contributor.author	Grigoropoulos, C	en
dc.date.accessioned	2014-03-01T01:46:50Z
dc.date.available	2014-03-01T01:46:50Z
dc.date.issued	1998	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/25051
dc.subject	Computer Generated Hologram	en
dc.subject	Excimer Laser	en
dc.subject	High Power	en
dc.subject	Optical Microscopy	en
dc.subject	Thermal Diffusion	en
dc.subject	Ultraviolet	en
dc.title	Microdeposition of metals by femtosecond excimer laser	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0169-4332(97)00713-7	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0169-4332(97)00713-7	en
heal.publicationDate	1998	en
heal.abstract	Microablation and transfer of thin metal films using ultrashort, ultraviolet laser radiation has been studied. A KrF excimer laser (λ=248 nm) having 500-fs pulse duration is coupled to a high-power image projection micromachining workstation. The laser irradiation is focused onto thin Cr films through the supporting transparent quartz substrates. Single pulses are used to completely remove the metal film. The	en
heal.journalName	Applied Surface Science	en
dc.identifier.doi	10.1016/S0169-4332(97)00713-7	en