A new process for the development of hard and stable sputtered amorphous carbon films

Logothetidis, S; Gioti, M; Charitidis, C; Patsalas, P

dc.contributor.author	Logothetidis, S	en
dc.contributor.author	Gioti, M	en
dc.contributor.author	Charitidis, C	en
dc.contributor.author	Patsalas, P	en
dc.date.accessioned	2014-03-01T01:47:46Z
dc.date.available	2014-03-01T01:47:46Z
dc.date.issued	1999	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/25320
dc.subject	Amorphous Carbon	en
dc.subject	Elastic Properties	en
dc.subject	Internal Stress	en
dc.subject	Rf Magnetron Sputtering	en
dc.subject	Spectroscopic Ellipsometry	en
dc.subject	Stress Relaxation	en
dc.subject	Thin Layer	en
dc.subject	X Ray Reflectivity	en
dc.title	A new process for the development of hard and stable sputtered amorphous carbon films	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0042-207X(98)00392-3	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0042-207X(98)00392-3	en
heal.publicationDate	1999	en
heal.abstract	We have developed a new process for building up thick and stable amorphous carbon films (a-C) rich in sp3 bonds with high hardness and controllable values of internal stress. The films were prepared by rf magnetron sputtering in multilayers (sequential thin layers with alternating positive and negative substrate bias voltage, Vb). Detailed analysis of in situ spectroscopic ellipsometry data, obtained	en
heal.journalName	Vacuum	en
dc.identifier.doi	10.1016/S0042-207X(98)00392-3	en