A new reactive pulsed laser ablation technique for the deposition of hard carbon and carbon-nitride thin films

Alexandrou, I; Zergioti, I; Amaratunga, G; Healy, M; Kiely, C; Hatto, P; Velegrakis, M; Fotakis, C

dc.contributor.author	Alexandrou, I	en
dc.contributor.author	Zergioti, I	en
dc.contributor.author	Amaratunga, G	en
dc.contributor.author	Healy, M	en
dc.contributor.author	Kiely, C	en
dc.contributor.author	Hatto, P	en
dc.contributor.author	Velegrakis, M	en
dc.contributor.author	Fotakis, C	en
dc.date.accessioned	2014-03-01T01:47:46Z
dc.date.available	2014-03-01T01:47:46Z
dc.date.issued	1999	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/25321
dc.subject	High Pressure	en
dc.subject	Laser Ablation	en
dc.subject	Mechanical Property	en
dc.subject	Microstructures	en
dc.subject	Nitrogen	en
dc.subject	Pulsed Laser Ablation	en
dc.subject	Pulsed Laser Deposition	en
dc.subject	Thin Film	en
dc.title	A new reactive pulsed laser ablation technique for the deposition of hard carbon and carbon-nitride thin films	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0167-577X(98)00223-7	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0167-577X(98)00223-7	en
heal.publicationDate	1999	en
heal.abstract	A new configuration of the pulsed laser deposition (PLD) technique for improving the growth of thin films in a gas ambient is described. A nozzle arrangement is used to create high pressure N2 and He pulses in the region above an ablated carbon target for the formation of C:N and C thin films. Films deposited by both the standard and	en
heal.journalName	Materials Letters	en
dc.identifier.doi	10.1016/S0167-577X(98)00223-7	en