Composition, chemical bonding and mechanical properties of magnetron sputtered CN x thin films at different substrate bias

Gioti, M; Logothetidis, S; Charitidis, C; Lefakis, H

dc.contributor.author	Gioti, M	en
dc.contributor.author	Logothetidis, S	en
dc.contributor.author	Charitidis, C	en
dc.contributor.author	Lefakis, H	en
dc.date.accessioned	2014-03-01T01:47:50Z
dc.date.available	2014-03-01T01:47:50Z
dc.date.issued	1999	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/25350
dc.subject	Amorphous Carbon	en
dc.subject	Data Analysis	en
dc.subject	Elastic Properties	en
dc.subject	Film Thickness	en
dc.subject	Magnetron Sputtering	en
dc.subject	Mechanical Property	en
dc.subject	Nitrogen	en
dc.subject	Optical Properties	en
dc.subject	Room Temperature	en
dc.subject	Spectroscopic Ellipsometry	en
dc.subject	Thermal Annealing	en
dc.subject	Thin Film	en
dc.subject	Fourier Transform	en
dc.title	Composition, chemical bonding and mechanical properties of magnetron sputtered CN x thin films at different substrate bias	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0042-207X(98)00421-7	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0042-207X(98)00421-7	en
heal.publicationDate	1999	en
heal.abstract	Nitrogenated amorphous carbon films (a-CNx) were prepared by reactive magnetron sputtering at room temperature with different substrate bias voltage (Vb) and N concentration in the plasma. In situ spectroscopic ellipsometry (SE) data analysis was used to monitor the composition and the film thickness as well as to study the optical properties. The negative Vb was found to affect the film	en
heal.journalName	Vacuum	en
dc.identifier.doi	10.1016/S0042-207X(98)00421-7	en