Deposition of carbon nitride films by reactive pulsed-laser ablation at high fluences

Zocco, A; Perrone, A; D'Anna, E; Leggieri, G; Luches, A; Klini, A; Zergioti, I; Fotakis, C

dc.contributor.author	Zocco, A	en
dc.contributor.author	Perrone, A	en
dc.contributor.author	D'Anna, E	en
dc.contributor.author	Leggieri, G	en
dc.contributor.author	Luches, A	en
dc.contributor.author	Klini, A	en
dc.contributor.author	Zergioti, I	en
dc.contributor.author	Fotakis, C	en
dc.date.accessioned	2014-03-01T01:47:54Z
dc.date.available	2014-03-01T01:47:54Z
dc.date.issued	1999	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/25359
dc.subject	Excimer Laser	en
dc.subject	Fourier Transform Infrared	en
dc.subject	Nitrogen	en
dc.subject	Nitrogen Content	en
dc.subject	Pulsed Laser Ablation	en
dc.subject	Scanning Electron Microscopy	en
dc.subject	Thin Film	en
dc.subject	X Ray Diffraction	en
dc.subject	X Ray Photoelectron Spectroscopy	en
dc.subject	Energy Dispersive X Ray	en
dc.subject	Rutherford Backscattering Spectroscopy	en
dc.subject	Single Bond	en
dc.title	Deposition of carbon nitride films by reactive pulsed-laser ablation at high fluences	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0925-9635(98)00357-4	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0925-9635(98)00357-4	en
heal.publicationDate	1999	en
heal.abstract	The effects of high laser fluence on the properties of CNx thin films prepared by reactive pulsed laser (KrF excimer laser, λ=248nm, τFWHM=30ns) ablation at two different N2 gas pressures were investigated. A variety of analytical techniques have been used to characterize the structure and properties of the deposited films: X-ray photoelectron spectroscopy; X-ray diffraction; scanning electron microscopy; energy dispersive	en
heal.journalName	Diamond and Related Materials	en
dc.identifier.doi	10.1016/S0925-9635(98)00357-4	en