Insights on the deposition mechanism of sputtered amorphous carbon films

Logothetidis, S; Gioti, M; Patsalas, P; Charitidis, C

dc.contributor.author	Logothetidis, S	en
dc.contributor.author	Gioti, M	en
dc.contributor.author	Patsalas, P	en
dc.contributor.author	Charitidis, C	en
dc.date.accessioned	2014-03-01T01:48:03Z
dc.date.available	2014-03-01T01:48:03Z
dc.date.issued	1999	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/25392
dc.subject	Amorphous Carbon	en
dc.subject	Elastic Properties	en
dc.subject	Growth Mechanism	en
dc.subject	Ion Bombardment	en
dc.subject	Low Energy	en
dc.subject	Magnetron Sputtering	en
dc.subject	Mechanical Property	en
dc.subject	Microstructures	en
dc.title	Insights on the deposition mechanism of sputtered amorphous carbon films	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0008-6223(98)00268-1	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0008-6223(98)00268-1	en
heal.publicationDate	1999	en
heal.abstract	Low energy Ar+ ion bombardment (LEIB) during growth of amorphous carbon (a-C) films deposited with magnetron sputtering (MS), results to dense films, rich in sp3 C–C bonds, and exhibit high hardness and compressive stress. We present here a preliminary study of the growth mechanism of a-C films deposited with negative bias voltage (LEIB) in terms of their composition, density and	en
heal.journalName	Carbon	en
dc.identifier.doi	10.1016/S0008-6223(98)00268-1	en