Nanoindentation and nanoscratching studies of amorphous carbon films

Charitidis, C; Logothetidis, S; Douka, P

dc.contributor.author	Charitidis, C	en
dc.contributor.author	Logothetidis, S	en
dc.contributor.author	Douka, P	en
dc.date.accessioned	2014-03-01T01:48:11Z
dc.date.available	2014-03-01T01:48:11Z
dc.date.issued	1999	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/25417
dc.subject	Amorphous Carbon	en
dc.subject	Elastic Modulus	en
dc.subject	Elastic Properties	en
dc.subject	Ion Bombardment	en
dc.subject	Layered Structure	en
dc.subject	Mechanical Property	en
dc.subject	Plastic Deformation	en
dc.subject	Rf Magnetron Sputtering	en
dc.subject	Thin Film	en
dc.title	Nanoindentation and nanoscratching studies of amorphous carbon films	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0925-9635(98)00285-4	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0925-9635(98)00285-4	en
heal.publicationDate	1999	en
heal.abstract	Hydrogen-free amorphous carbon (a-C) films prepared by RF magnetron sputtering were deposited on Si substrates in thin films, at various negative bias voltages Vb (i.e. Ar-ion energies), and in thick layered-structure films with alternative values of Vb. The main purposes of this work are to present preliminary results concerning the effect of Ar-ion bombardment during deposition on the elastic properties	en
heal.journalName	Diamond and Related Materials	en
dc.identifier.doi	10.1016/S0925-9635(98)00285-4	en