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A comparative study of the nanoscratching behavior of amorphous carbon films grown under various deposition conditions

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dc.contributor.author Charitidis, C en
dc.contributor.author Logothetidis, S en
dc.contributor.author Gioti, M en
dc.date.accessioned 2014-03-01T01:49:06Z
dc.date.available 2014-03-01T01:49:06Z
dc.date.issued 2000 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/25676
dc.subject Amorphous Carbon en
dc.subject Coefficient of Friction en
dc.subject Deformation Mechanism en
dc.subject Layered Structure en
dc.subject Magnetron Sputtering en
dc.subject Plastic Deformation en
dc.subject Thin Film en
dc.title A comparative study of the nanoscratching behavior of amorphous carbon films grown under various deposition conditions en
heal.type journalArticle en
heal.identifier.primary 10.1016/S0257-8972(99)00546-0 en
heal.identifier.secondary http://dx.doi.org/10.1016/S0257-8972(99)00546-0 en
heal.publicationDate 2000 en
heal.abstract Two types of amorphous carbon (a-C) films: one series with a layered structure (sequence of soft/hard carbon layers) resulting in thick, stable and sp3 rich films, and another series of monolithic films rich in sp2, were deposited on Si substrates by magnetron sputtering and were investigated with respect to their nanoscratching behavior. The main purposes of this work are to en
heal.journalName Surface & Coatings Technology en
dc.identifier.doi 10.1016/S0257-8972(99)00546-0 en


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