A comparative study of the nanoscratching behavior of amorphous carbon films grown under various deposition conditions

Charitidis, C; Logothetidis, S; Gioti, M

dc.contributor.author	Charitidis, C	en
dc.contributor.author	Logothetidis, S	en
dc.contributor.author	Gioti, M	en
dc.date.accessioned	2014-03-01T01:49:06Z
dc.date.available	2014-03-01T01:49:06Z
dc.date.issued	2000	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/25676
dc.subject	Amorphous Carbon	en
dc.subject	Coefficient of Friction	en
dc.subject	Deformation Mechanism	en
dc.subject	Layered Structure	en
dc.subject	Magnetron Sputtering	en
dc.subject	Plastic Deformation	en
dc.subject	Thin Film	en
dc.title	A comparative study of the nanoscratching behavior of amorphous carbon films grown under various deposition conditions	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0257-8972(99)00546-0	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0257-8972(99)00546-0	en
heal.publicationDate	2000	en
heal.abstract	Two types of amorphous carbon (a-C) films: one series with a layered structure (sequence of soft/hard carbon layers) resulting in thick, stable and sp3 rich films, and another series of monolithic films rich in sp2, were deposited on Si substrates by magnetron sputtering and were investigated with respect to their nanoscratching behavior. The main purposes of this work are to	en
heal.journalName	Surface & Coatings Technology	en
dc.identifier.doi	10.1016/S0257-8972(99)00546-0	en