A study on the bonding structure and mechanical properties of magnetron sputtered CN x thin films

Laskarakis, A; Logothetidis, S; Charitidis, C; Gioti, M; Panayiotatos, Y; Handrea, M; Kautek, W

dc.contributor.author	Laskarakis, A	en
dc.contributor.author	Logothetidis, S	en
dc.contributor.author	Charitidis, C	en
dc.contributor.author	Gioti, M	en
dc.contributor.author	Panayiotatos, Y	en
dc.contributor.author	Handrea, M	en
dc.contributor.author	Kautek, W	en
dc.date.accessioned	2014-03-01T01:50:41Z
dc.date.available	2014-03-01T01:50:41Z
dc.date.issued	2001	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/26069
dc.subject	High Energy	en
dc.subject	Ion Bombardment	en
dc.subject	Low Energy	en
dc.subject	Magnetron Sputtering	en
dc.subject	Mechanical Property	en
dc.subject	Nitrogen	en
dc.subject	Rf Magnetron Sputtering	en
dc.subject	Thin Film	en
dc.subject	X Ray Photoelectron Spectroscopy	en
dc.subject	Fourier Transform	en
dc.title	A study on the bonding structure and mechanical properties of magnetron sputtered CN x thin films	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0925-9635(00)00576-8	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0925-9635(00)00576-8	en
heal.publicationDate	2001	en
heal.abstract	Carbon nitride (CNx) films have been deposited by reactive (RF) magnetron sputtering, in order to investigate the effect of the energetic ion bombardment during deposition (IBD), in terms of applied Vb, on their bonding structure. Fourier Transform IR Ellipsometry (FTIRE) and X-ray photoelectron spectroscopy (XPS) were used for the investigation of the films bonding structure, while their mechanical properties were	en
heal.journalName	Diamond and Related Materials	en
dc.identifier.doi	10.1016/S0925-9635(00)00576-8	en