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Electrical properties of magnetron sputtered amorphous carbon films with sequential sp(3)-rich/sp(2)-rich layered structure

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dc.contributor.author Hastas, NA en
dc.contributor.author Dimitriadis, CA en
dc.contributor.author Tassis, DH en
dc.contributor.author Panayiotatos, Y en
dc.contributor.author Logothetidis, S en
dc.contributor.author Papadimitriou, D en
dc.date.accessioned 2014-03-01T01:51:09Z
dc.date.available 2014-03-01T01:51:09Z
dc.date.issued 2001 en
dc.identifier.issn 0003-6951 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/26232
dc.subject.classification Physics, Applied en
dc.subject.other MECHANISM en
dc.title Electrical properties of magnetron sputtered amorphous carbon films with sequential sp(3)-rich/sp(2)-rich layered structure en
heal.type journalArticle en
heal.language English en
heal.publicationDate 2001 en
heal.abstract The electrical properties of thick amorphous carbon (a-C) films with sequential sp(3)-rich/sp(2)-rich layered structure, grown by magnetron sputtering on Si substrates at room temperature, were investigated. At low electric fields, the conduction is due to the variable range hopping mechanism. At high electric fields, thermally assisted band-to-band indirect tunneling is the dominant conduction mechanism, while the Arrhenius plots of the current show a deviation from straight lines in the form of continuous bending satisfying the Meyer-Nelder rule. Comparative studies of low-frequency noise in sp(2)-rich single layer and sp(3)-rich/sp(2)-rich layered a-C films indicate that the noise in the a-C layered originates from traps located mainly at the interfaces of the sp(3)-rich/sp(2)-rich bilayers. (C) 2001 American Institute of Physics. en
heal.publisher AMER INST PHYSICS en
heal.journalName APPLIED PHYSICS LETTERS en
dc.identifier.isi ISI:000172046800019 en
dc.identifier.volume 79 en
dc.identifier.issue 20 en
dc.identifier.spage 3269 en
dc.identifier.epage 3271 en


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